Used NOVELLUS Inova #100556 for sale

NOVELLUS Inova, is an advanced chemical vapor deposition (CVD) reactor used in the semiconductor manufacturing industry. It is characterized by its superior capability for producing superior, ultra-thin layers of material with a consistent and uniform thickness, for applications such as high-performance nanodevices and memory chips. The machine features an innovative design with a built-in sputtering capability that helps to further optimize the deposition process and eliminate any level of variability in film thickness, layer uniformity and precision required by advanced semiconductor devices. Inova reactor uses a two-zone design to accommodate two process temperatures. The first zone is used to preheat the substrate before introduction into the CVD process, while the second zone is the main CVD processing zone. Utilizing only two heating zones helps to conserve thermal energy, improving efficiency and reducing operational costs. As the substrate is transferred from the first to the second zone, the change in temperature is minimized, helping to avoid thermal shock and damage to the material surface. The reactor also features a patented active temperature control system (ATCS) which offers superior thermal uniformity across the entire substrate surface. Additionally, the ATCS offers superior process control due to its advanced real-time monitoring and control of various gases used in the CVD process, including oxygen, deposition gas, halogen gas and other select gases. With this functionality, users are able to easily program process recipes on the fly, ensuring process stability and minimizing difficult transportations of gases during the process. In addition to its superior design, NOVELLUS Inova is also equipped with a full range of post-process cleaning tools, such as thermal processing, ion etching, and rapid thermal annealing. This allows users to quickly complete the entire process, from cleaning through to deposition, in a single, efficient operation. This helps to reduce or eliminate the need for additional labor and resources. In conclusion, Inova is an advanced chemical vapor deposition (CVD) reactor designed specifically for the semiconductor processing industry. It enables manufacturers to achieve superior results in a highly efficient process, thanks to its two-zone design, active temperature control system, and a full range of post-process cleaning tools. As such, it is the ideal choice for manufacturers looking for an efficient and reliable deposition tool with superior filtration and process uniformity.