Used NOVELLUS Inova #293589650 for sale

NOVELLUS Inova is a plasma etching reactor that is used for semiconductor device manufacturing. It uses radio frequency (RF) to create a plasma from a mixture of gases, exposing the substrate to the plasma, and then using the plasma to etch the substrate. The reactor consists of a four-chamber design with multiple sources of radio frequency power. The individual chambers can be configured for different types of etching processes. The main chamber of the reactor is where the substrate is placed for processing. This chamber is connected to a gas source, typically a gas supply line containing a mixture of various gases. The mixture of gases, the pressure and the temperature in this chamber can be controlled to optimize the etching process. The plasma that is created in this chamber is confined and sustained by magnetic fields, and the shape of the plasma can be adjusted. The second chamber of the reactor consists of two independently-controlled sources of RF power. The power supplies can be adjusted in both frequency and amplitude to regulate the plasma. The power source can be used to create and sustain large, uniform plasmas. The third chamber of the reactor consists of two "sparkplug electrodes" that are used to create a strong electric field between the main chamber and the power sources. This electric field can be used to shape and manipulate the plasma in the main chamber. Finally, the fourth chamber of the reactor consists of a vacuum system that is used to maintain the pressure inside the main chamber. It draws the gases from the main chamber after etching is complete, eliminating the risk of accidental exposure to hazardous materials. Overall, Inova is an advanced, reliable plasma etching reactor that can be used for a wide variety of etching processes. Its individual chambers can be configured for different etching processes, and its sources of power can be used to generate and manipulate large, uniform plasmas. Moreover, its vacuum system offers assurance that hazardous materials are never exposed outside the reactor.