Used NOVELLUS Inova #9188675 for sale

NOVELLUS Inova is a reaction chamber designed to process various high-temperature operations such as depositing thin films and heat-treating films over a substrate. It includes all the necessary features for efficient substrate processing, such as vacuum integrity, uniform temperature distribution, particle-cleaning capabilities, and high throughput. Inova is designed to handle up to 4" wafer substrates with a maximum temperature rating of 1,100°C in an inert atmosphere. It has a powerful low-vacuum induction-heating system capable of achieving rapid heating rates without the risks of contamination caused by thermal runaway. Additionally, the robust linear heating rate control mechanism provides excellent temperature uniformity throughout the chamber. NOVELLUS Inova's particle-cleaning capabilities are ensured by the combination of multiple vacuum-cleaning components, including a turbo pump and a mechanical rotary pump, and by a combination of several filters. The effective combination sensors in the chamber further enhance particle-cleaning ability. Inova provides excellent throughput with its fast cycle times and small footprint. The highly refined operating software allows the user to program any operation sequence and parameters, making fabrication of large volumes of components a simple task. In addition to its easy operation and reliable performance, NOVELLUS Inova boasts a number of safety features, such as dual-walled vacuum chamber construction for safety and efficient energy management, gas cooling systems, fail-safe protection mechanisms, and thermal protection elements. Inova is a highly versatile and reliable reaction chamber with a wide range of applications. It is an invaluable tool for materials processing and offers a robust solution for manipulating substrates in demanding thermal processes.