Used NOVELLUS Inova #9204137 for sale

NOVELLUS Inova is a chemical vapor deposition (CVD) reactor that consists of three core components: metal heated chamber, precise gas control equipment, and a rotating reactor source. The metal heated chamber is a semi-cylindrical stainless steel structure that is divided into two compartments: the lower one for substrate heating and the upper one for the gas-power, turbo-pumping system. The lower compartment of the heated chamber consists of perforated grids with e-chuck electrodes, which act like a platform for controlling and modulating the substrate heating temperature. The upper compartment houses the gas-power and turbo-pumping systems, which provide a controlled environment for chemical vapor deposition. The precise gas control unit in Inova reactor provides high precision control of process gases during deposition. It provides direct control over the gas distribution around the substrate, which can help optimize the film formation rate and uniformity. The gas control machine includes mass flow controllers, safety shutoff valves, pressure transducers, metering flow valves, and microbubble flow detectors. The size and shape of the substrate to be coated can be programmed into NOVELLUS Inova reactor. The rotating reactor source performs an orbital pattern motion over the substrate, which ensures that uniform coverage of the desired film is achieved. Additionally, the pressure, flow rate, and temperature of each of the deposition gases can be controlled separately, allowing the deposition of highly intricate and complex films. Overall, Inova is a reliable and highly accurate CVD device. Its combination of components and ability to precisely control the parameters of the deposition process make it ideal for the fabrication of advanced thin films. It has been used in a wide range of applications, including semiconductor, display, microelectronics, and optics. The scalability and flexibility of the device also make it versatile enough for research and development purposes.