Used NOVELLUS Inova #9223198 for sale

NOVELLUS Inova is a chemical vapor deposition (CVD) tool used to deposit thin films on semiconductor wafers for advanced microelectronic device fabrication. It's a powerful tool to achieve precise, uniform and repeatable deposition of films, which are essential in delivering high-performance semiconductor components with minimal defects. Inova consists of a showerhead counter-balanced by a robot arm, a reactor chamber, a heated diffusion shield, and associated process gas delivery lines such as hydrogen and silicon-containing gases. The showerhead is a double-sided, electron-beam-heated, insulated two-position platform with temperature sensors embedded in its insulated base. The robot arm is a five-axis device that moves in the x, y and z directions, as well as rotates and pivots. It's connected to the showerhead and used to load wafers directly from the automated substrate storage system and the process transfer system. The reactor chamber is an electro-polished stainless steel housing with an O-ring-sealed bellows-type airlock door. A diffusion shield installed inside the chamber contains a resistively heated ring for precise and uniform heating of the substrate surface. The shield is also coated with titanium carbide to protect it from the environment and to further enhance the uniform temperature cycling of the substrate surface. NOVELLUS Inova is an automated system for precise control of deposition processes. A built-in motion controller helps ensure highly accurate heating of the substrate and uniform deposition across multiple wafers. Process gas lines are responsible for supplying the volatiles needed to create thin films on a substrate. Silane (SiH4) and dichlorosilane (SiH2Cl2) are the primary gases used in this platform as they react to form silicon dioxide (SiO2) films. These reactant gases are injected into the reactor chamber for in-situ chemical reactions on the substrate surface. A series of pressure and mass flow controllers are used to control gas delivery in Inova. Once the substrate is preheated to optimum temperature, a constant flow of reactants is activated, and a finite temperature cycle is applied using the diffusion shield and the motion controller. NOVELLUS Inova is an incredibly powerful and precise deposition tool, and its automated operation enables repeatable and uniform deposition across multiple wafers. It is an essential tool in modern semiconductor manufacturing.