Used NOVELLUS Inova #9272601 for sale

NOVELLUS Inova is a revolutionary plasma enhanced chemical vapor deposition reactor designed to maximize throughput and reduce costs for applications such as the deposition of thin-film optoelectronics, thin-film transistors (TFTs) and other advanced materials for the semiconductor industry.Inova plasma source is a patented technology that utilizes a simple and reliable design to generate energetic, non-thermal plasma and can be adjusted to a wide range of plasma parameters and thermal budget requirements. This reactor's unique design also provides customizable particle acceleration and can operate with either RF or DC power sources. NOVELLUS Inova plasma source may be operated with pressures up to 6 mTorr and temperatures up to 700 C to produce devices with minimum density, thickness and uniformity requirements. The reactor also includes a number of additional features, such as a variable frequency and temperature ramping system, which provide additional control over the plasma environment. Inova can be used with virtually any gas chemistry, including those which are pre-combined for specific applications. Alternatively, binary and tertiary gas chemistries can also be used to precisely control the desired effects and outcomes. This enables NOVELLUS Inova to be used in applications where precision and accuracy are of utmost importance. The unique Inova design also includes a self-cleaning feature which allows chemical deposits to be removed from the source block in a matter of minutes. This ensures the block remains free from contaminants and enables the entire process to remain clean and contamination free. In addition, NOVELLUS Inova comes with a multitude of functions and features that can be used to customize the system configuration to specific operations and applications. For example, the software is updated regularly to ensure that all new features are added and to ensure optimum performance in the most demanding applications. To summarize, Inova is a revolutionary plasma enhanced chemical vapor deposition reactor that offers premier flexibility, accuracy and precision for semiconductor applications. The unique design offers a wide range of variable frequency, temperature ramping and self-cleaning features that can be used to tailor the system to any specific application. Finally, this reactor's reliable and efficient design ensures that the entire process is clean and contamination free, making it ideal for a range of semiconductor applications.