Used NOVELLUS Inova #9383177 for sale

NOVELLUS Inova is a high productivity process reactor for the semiconductor industry that combines breakthrough low-temperature processing with fast cycle time and high uniformity. Its unique patented features provide a versatile platform that enables reliable processing of the entire range of technologies, from advanced node to sub-5 nm. Inova reactor capabilities are powered by in-situ process diagnostics, adaptive control, and advanced material targeting. Its Integrated RF Impedance Match (RFI) system provides greater process control within a sCMOS wafer bin, while also offering maximum flexibility for changing process requirements. The reactor has also been designed to support a wide range of substrates, including advanced wafers such as FinFET and 3D structures. NOVELLUS Inova reactor operates at temperatures up to 400°C at pressures ranging from 200-600 mTorr, which provides an impressive level of process flexibility for etching, deposition, and annealing functions. The reactor incorporates a proprietary Vapor Flow Dynamics (VFD) technology which enables improved deposition conformality and utilization of complex new deposition chemistries. Inova reactor also boasts an innovative NOVELLUS Inova Pulsation technology that reduces cycle time while promoting better uniformity and reduced defectivity. This technology generates a short, precise array of pulses in one second, which allows for reliable thin film application processes. It also uses an optimized gas kinetic distribution which ensures homogeneity of material deposition. Inova's superior level of performance is achieved through its sophisticated temperature and pressure management system. Its high-end processing software has been designed to provide real-time and predictive feedback regarding wafer Process Index (PI), a key parameter in the semiconductor process. Users can use the PI to determine the precise etch rate, deposition rate, or wafer temperature. To further enhance process results, NOVELLUS Inova offers a number of optimization features, such as uniformity and in-wafer targeting. This, coupled with a range of additional software tools, ensures that the highest quality results can always be obtained. Overall, Inova is a highly advanced process reactor which has been designed to maximize productivity and efficiency while also delivering the best possible yield, uniformity and defectivity. Its automated process capabilities and innovative features make it the perfect choice for any semiconductor process.