Used NOVELLUS Inova #9384622 for sale

NOVELLUS Inova is a deposition reactor that is designed to facilitate high quality thin film deposition for semiconductor applications. Inova combines high aspect ratios, high accuracy, and superior flux control in order to produce the highest quality films in the most efficient manner. The reactor is designed with a dual chamber configuration that allows users to deposit films as thin as 5 nm. NOVELLUS Inova has a proprietary electrostatic chuck that prevents particles and debris from accumulating during deposition. This reduces the risk of contamination and improves on-wafer uniformity. Inova also utilises a unique second chamber design. This allows for accurate flux control at different temperature and pressure levels to create superior uniformity across the wafer and increase the performance of the deposited film. The reactor is also designed with a plasma-based deposition technique that allows for precise control of the rate of deposition and increases reliability of the performance of the films. NOVELLUS Inova can be used in a variety of different deposition processes including Thermal Chemical Vapor Deposition (TCVD), Atomic Layer Deposition (ALD), and Physical Vapor Deposition (PVD). In addition, Inova has a number of other features that make it a powerful and versatile deposition tool. Its advanced control software allows for precise and repeatable control of the process variables. NOVELLUS Inova also features an adjustable bellows system that produces even deposition rates and uniformity across the wafer. The reactor also has a sophisticated optical monitoring system that continuously checks the integrity of the deposited film. Overall, Inova is an advanced deposition reactor that provides superior performance and yields. Its dual chamber design provides reliable and consistent deposition, and its adjustable bellows system ensures uniformity and accuracy. NOVELLUS Inova is a powerful tool that is trusted by semiconductor industries worldwide to provide high quality thin film deposition.