Used NOVELLUS Inova #9399582 for sale

NOVELLUS Inova
Manufacturer
NOVELLUS
Model
Inova
ID: 9399582
Vintage: 2012
PVD System 2012 vintage.
NOVELLUS Inova is a reactor designed for deposition and etching of semiconductor materials. It is based on Inductor-Coupled Plasma (ICP) technology, utilizing high frequency power for plasma generation. This reactor provides outstanding process uniformity for various applications including etchback, descum, and barrier metal processes. Inova employs unique hardware and software features to ensure consistent process uniformity with a high degree of variability. NOVELLUS Inova's hardware includes a high-power ICP driven inductor with a cylindrical shape, capable of producing high frequency arcs, while also using high-voltage to generate a plasma. Inova also utilizes a linear RF power generator with a focus on controlling the plasma density, while also offering uniformity in etch back processes. Additionally, NOVELLUS Inova includes a "Plasma Drum", which is an innovative device made of graphite material with embedded electrodes that create uniform plasma across the whole surface of the substrate being processed. This helps to minimize source-level non-uniformity, as well as prevent charge-up. Additionally, the Plasma Drum allows for optimized spacing between the Plasma Generator and the dummy electrode, which ensures high ion energy and yields better process results. In terms of software, Inova utilizes several features for further enhanced uniformity. These features are designed to optimize process control by monitoring the substrate surface and adjusting the plasma energy output in order to achieve the desired results. Additionally, NOVELLUS Inova also leverages Endura and Kinetic Sputter Index sensing technologies to precisely measure the local etchback parameters. Through a combination of real-time and offline process control, Inova is capable of achieving sub-micron accuracy and repeatability across all applications. In conclusion, NOVELLUS Inova is a powerful reactor based on ICP technology, offering outstanding process uniformity across various applications. With its unique hardware and software features, Inova offers unparalleled precision, accuracy, repeatability and variability for etch back, descum, and barrier metal processes.
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