Used NOVELLUS / LAM Sabre Next 200 #293590631 for sale

NOVELLUS / LAM Sabre Next 200 is a plasma-enhanced low-pressure chemical vapor deposition (PE-LPCVD) reactor optimized for integrated circuit (IC) manufacturing. It is designed to enable process throughputs of up to 200 wafers/hour with a loadlock capacity of 200 wafers. It features a multi-zone, low-pressure etch chamber for controlled etching of polysilicon and other materials with high dielectric constant layers. LAM Sabre Next 200 utilizes a 4" wafer size and is based on the Ultima platform, featuring enhanced DC power supplies and improved chamber matching technology. The gas delivery and control equipment has been designed to enable effective deposition of high-quality materials. The process chamber is outfitted with a turntable and ultrasound technology, as well as a precision laser system to enable uniform, high-quality wafer etching. NOVELLUS Sabre Next 200 also offers high altitude control accuracy, with a 12 bit encoder unit enabling a resolution of 0.2 microns at the wafer level. It has an optional cooling platen feature to enable the development of temperature critical materials. In addition, the reactor can be configured with thermoplastic or ceramic heating stages with a temperature range of up to 600°C. Sabre Next 200 features two distinct etch processes, namely PE-LPCVD and glow discharge oxidation. The Plasma Enhanced version utilizes oxygen, nitrogen, and/or silane for controlled etch rate. The glow discharge oxidation process allows for higher doped polysilicon deposition rates and optimized thickness control. NOVELLUS / LAM Sabre Next 200 is also equipped with a patented, in-situ metal liftoff machine, which enables better process control. The advanced control tool of the Sabre Insight 200 allows operators to monitor the process parameters in real time. This advanced HMI asset is integrated with an extensive recipe library and can be adapted to future technologies. In addition, the reactor is designed with an open architecture, allowing it to easily integrate with the existing factory Production Management and Design Automation systems. LAM Sabre Next 200 is an innovative, advanced reactor perfect for high-volume IC production. It is designed to enable high levels of process throughput with a high quality dielectric etch for process-dependent materials. NOVELLUS Sabre Next 200 provides an advanced and flexible control model, allowing an easy integration with existing facility control systems and presenting a great opportunity to increase production efficiency.