Used LAM RESEARCH / NOVELLUS Vector Express #9169612 for sale

LAM RESEARCH / NOVELLUS Vector Express is a high-performance, efficient etching equipment used in the semiconductor and related industries. It is designed to provide high precision, reliable, and fast etching of substrates such as quartz wafers, silicon substrates, and other conducting and non-conducting materials in a high-temperature environment. NOVELLUS Vector Express is capable of etching aspect ratios of up to 1:25 and offers a high throughput of up to 1.5 wafers per minute. LAM RESEARCH Vector Express utilizes multiple high-performance etching chambers, each with an independently controlled process chamber and dedicated pumping systems. This system is designed to reduce deposition time, minimize wafer damages, and provide superior process uniformity. The unit also offers fine-tuned control over the etching process, allowing for precise control over critical features. Within each etching chamber, the machine employs a multi-zone temperature and pressure control to create a consistent environment throughout each chamber. This tool features integrated heating and cooling for high-reliability etching. Additionally, the etching chamber utilizes a dedicated gas mixing asset that precisely injects fluorine-based reactive gases (e.g. SF6, NF3, and CF4) into the etching chamber with precision and control. Vector Express also features an Advanced Chamber Impedance Control (CIC) model that provides a uniform plasma for improved etching performance. LAM RESEARCH / NOVELLUS Vector Express utilizes an advanced user-friendly and intuitive graphical interface for ease of control and program development. This equipment also allows seamless integration with all standard etching control systems for maximum flexibility and productivity. It is designed for minimal maintenance and up-time, and is certified for SEMI safety standards for maximum operator safety. NOVELLUS Vector Express is capable of producing excellent etching quality and performance in a variety of materials and applications, making it a reliable and efficient choice for high-volume etching applications. It is a quick and cost effective solution that offers superior reliability, efficiency, and uniformity.