Used NOVELLUS Sabre Next #9281286 for sale

NOVELLUS Sabre Next is a next-generation atomic layer deposition (ALD) reactor used to deposit one or more layers of ultra-thin, conformal films on a variety of substrates. This is done using a pulsing gas source to deliver species to the reactor chamber, where they react with the substrate, resulting in the deposition of nanometer-scale films. The deposition process is highly repeatable, allowing the creation of films whose thickness, coverage, and composition can be precisely controlled. Sabre Next reactor combines ALD technology with advanced computer systems and efficient engineering to create a platform that provides excellent film properties and repeatability. It includes intuitive user interface controls and automated material handling to reduce operator intervention and increase throughput. The reactor's housing is composed of several parts, including a main chamber, a gas delivery equipment with multiple gas sources, and a substrate holder. The reactor also includes a heating system, a cooling unit, a vacuum machine, and an exhaust tool. NOVELLUS Sabre Next reactor utilizes a patented pulsing gas delivery asset to precisely control the deposition. This model consists of a series of magnetic components, which create a field that causes the reactant pulses to travel in a specific, predictable pattern. This results in a uniform film deposition, allowing for an exact and reproducible composition. Sabre Next also includes features such as an automated material handling equipment, real time process monitoring, multi-zone set points, and exceptional fault tolerance that reduce the risk of process errors and enable statistical process control. Furthermore, the process can be easily scaled for different application requirements. Overall, NOVELLUS Sabre Next is a next-generation, advanced ALD reactor that provides repeatable, high-quality deposition of one or more nanometer-scale films. It is suitable for a variety of substrates and applications, including advanced thin-film electronics, optics, and chemical vapor deposition of metals.