Used NOVELLUS Sabre XT #293713734 for sale
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ID: 293713734
System
(5) PC:
(3) Node computers
Proteus computer
Chase computer
Does not include Hard Disk Drive (HDD).
NOVELLUS Sabre XT is a reactor that consists of an inductively coupled plasma (ICP) source, a reaction chamber, and adjustable gas feeds to precisely control the process environment. The ICP source uses RF energy to generate multiple plasma plumes of process gases that diffuse outward from the source in an evenly distributed manner. The source of the plasma is highly adjustable, allowing it to be tailored to meet the requirements for different plasma processes. The reaction chamber is capable of quickly and accurately adjusting gas and pressure, allowing for precise control of the process environment. This reactor is well suited for many processes, such as CVD, PECVD, and plasma etching. NOVELLUS SABREXT is a flexible and highly efficient reactor. It is capable of withstanding a wide temperature range, allowing it to be used for processes that require a large temperature range. Additionally, the use of an adjustable RF feed allows for precise control of the plasma's energy density. This enables processes that involve the deposition of thin layers of various materials, such as silicon oxide and silicon nitride, onto substrates. This feature also allows for more efficient plasma etching and cleaning of substrates. Sabre XT reactor is also equipped with a variety of safety features to protect the user and the equipment. It is designed to operate within a very strict range of temperatures and pressures and can quickly shut down in the event of a process error or malfunction. Furthermore, it is also equipped with gas flow sensors, allowing for quick and accurate adjustments to the process environment. This ensures that any potential hazardous gases are quickly removed from the chamber before they can cause any harm. Overall, SABREXT reactor is a highly efficient and reliable reactor for many plasma-based processes. Its adjustable RF feed allows for precise control of the plasma's energy density and its safety features provide additional peace of mind. The variety of material and process options make the reactor an ideal choice for use in semiconductor fabrication. Furthermore, the ability to quickly readjust the process environment ensures that the process remains safe and that any potential plumes of hazardous gases are quickly removed from the chamber.
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