Used NOVELLUS Sabre XT #9058226 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Manufacturer
NOVELLUS
Model
Sabre XT
ID: 9058226
Wafer Size: 8"
Vintage: 1999
ECD Plater, 8" Model #: C2-Sabre Integrated frame With (3) plating modules Phase 3 anode chamber 8" Clamshell drive unit 196 mm Clamshell cup and cone (Phase 1A ceramic cup) Pulse plating capability AE Pulse power supply (3) Additive dosing systems with nowpak Bath chemistry control algorithm Central bath reservoir (150 L) (3) Post-Electrofill modules Edge bead removal (EBR) (5) Chambers anneal capability 50-400 C, H2/Forming gas BROOKS (4) Axes atmospheric dual-end effector robot BROOKS Accutran front-end robot Main power panel Secondary containment With splash guards and leak detection Dual waste stream plumbing Pentium-based CPU Graphical user interface (GUI) SECS/GEM compatibility Currently crated 1999 vintage.
NOVELLUS Sabre XT is a chemical vapor deposition (CVD) reactor designed for use in the semiconductor manufacturing industry. It utilizes a platter-based design coupled with the proprietary Enhanced CVD (ECVD) process in order to achieve high uniformity and throughput of the targeted films. NOVELLUS SABREXT's optimized platter design is constructed with two opposing VTEC thermoelectric coolers, allowing for optimal performance and temperature regulation in a narrow target range. The platter is also covered in a corrosion-resistant material, which protects its inside components during operation. The ECVD process of Sabre XT operates in a single-chamber vacuum environment at temperatures between 100°C and 400°C. During operation, the system injects reactants such as silane gas and ammonia into the reactor chamber, along with reactive gas precursors that pass through a rotating torch, which precisely dispenses the incoming gas mixtures. This rotating torch allows for high-precision film deposition uniformity within the chamber, where target thickness and uniformity are collected through a number of optical monitoring systems. SABREXT also integrates several advanced process monitoring capabilities, including a continuous feedback system that allows it to precisely control the flow and mixing of the reactant gases. This gives NOVELLUS Sabre XT the ability to automatically adjust settings in order to achieve a more uniform deposition of the targeted films, as well as enabling it to monitor any potential contamination within the reactor environment. NOVELLUS SABREXT's versatility and reliability makes it a premier choice for semiconductor manufacturing applications requiring high-volume production with reliable process and film uniformity. Its solid-state operation ensures a low-maintenance and cost-effective solution for the production of modern chipsets and other semiconductor products. In addition, Sabre XT's corrosion-resistant platter design and ease of integration into a wide variety of CVD systems makes it an ideal choice for leading chip manufacturers worldwide.
There are no reviews yet