Used NOVELLUS Sabre XT #9275235 for sale

Manufacturer
NOVELLUS
Model
Sabre XT
ID: 9275235
Wafer Size: 8"
Vintage: 2001
Electro copper plating system, 8" Ergo Cassette Loader (ECL) ART7 Robot Clamshell cup: POR PPS Chuck Hard Disk Drive (HDD) missing Integrated frame: (3) Plating modules 3-Phase anode chamber (3) SRD Modules Anneal: (5) Anneal chambers Temperature: 50°C - 400°C Forming gas: H2 BROOKS AUTOMATION 4-Axis atmospheric dual-end effector robot Front end robot: BROOKS AUTOMATION Accutran robot CUP: Pentium SECS/GEM: Comparability System controller Tool generation: SABRE-XT (25) Wafers per cassette Graphic User Interface (GUI) Signal tower: (3) Colors Host connection type: RS232 C Mini-environment: Synetics Desktop PC Central Bath Reservoir: 150 liters for (3) Plating modules Exhaust kit: Top mount Cassette handler module: (3) Load port stations Wafer aligner type: Mechanical center finder End effector Wafer release with puff Magstore 1.7.0 Robot firmware Mapping type: Through beam Plating cell configuration: Cell 1 / 2 / 3 Clamshell: Drive unit, 8" Clamshell cup: 1 A Ceramic Cup Clamshell cone: 196 mm Phase Clamshell cylinder: Pressure vacuum cylinder Anode Type: 3-Phase Clamshell lift Additive dosing: NowPack Bath chemistry: Control algorithm AE Pulse plating power supply Post plating cell configuration: Cell 1 / 2 / 3 Edge bead removal Wafer present sensor mount Bath module: (2) Florite totalizer (3) Dosing pumps Recirculation pump: Inverter NESLAB HX-75 A Heat exchanger 2001 vintage.
NOVELLUS® NOVELLUS Sabre XT reactor is a precision-controlled chemical vapor deposition (CVD) equipment that enables customers to perform high-yield and accurate films deposition on a large array of materials. The system has been specifically designed for optimized thin-film deposition in the semiconductor manufacturing field. NOVELLUS SABREXT reactor offers a number of benefits, such as low cost of ownership, improved productivity, excellent design flexibility, and consistency of process results. The unit is highly accurate with a high degree of control and offers a full suite of process options with both single- and dual-chamber systems. The CVD process of Sabre XT reactor is integrated with a number of features such as pre-heating, cooling, and intelligent sensing. The pre-heating is important for setting the substrate temperature correctly before the deposition proceeds. The cooling feature helps to ensure that the substrate is brought back to the desired temperature quickly after the deposition. The intelligent sensing of the process allows the machine to detect, identify, and control the gas flows accurately, thereby ensuring a precise and uniform deposition of the film. The reactor features a unique filter chamber design which helps to minimize the introduction of particles into the process chamber. The crossover chamber also helps to prevent condensation of process gases that are condensed in the hoods. The tool has a multi-step process which is optimized for the high throughput of multiple substrates. SABREXT asset also has an advanced plasma source compatible with a number of gas disposal technologies. The new plasma source supports ultra-high purity source gas, high throttle gas flow, and high source exhaust pressure. This allows for higher deposition rates, higher power densities, and lower effective temperature. In conclusion, NOVELLUS® NOVELLUS Sabre XT reactor is a modern and advanced CVD model that helps to achieve higher yields and consistent results in the field of semiconductor manufacturing. The equipment features low ownership costs, increased productivity, and flexible design capabilities. It is also equipped with advanced features such as pre-heating, cooling, and intelligent sensing. The filter chamber design and specialized plasma source make NOVELLUS SABREXT a complete package for reliable CVD processes.
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