Used NOVELLUS Sabre XT #9275235 for sale
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ID: 9275235
Wafer Size: 8"
Vintage: 2001
Electro copper plating system, 8"
Ergo Cassette Loader (ECL)
ART7 Robot
Clamshell cup: POR
PPS Chuck
Hard Disk Drive (HDD) missing
Integrated frame:
(3) Plating modules
3-Phase anode chamber
(3) SRD Modules
Anneal:
(5) Anneal chambers
Temperature: 50°C - 400°C
Forming gas: H2
BROOKS AUTOMATION 4-Axis atmospheric dual-end effector robot
Front end robot: BROOKS AUTOMATION Accutran robot
CUP: Pentium
SECS/GEM: Comparability
System controller
Tool generation: SABRE-XT
(25) Wafers per cassette
Graphic User Interface (GUI)
Signal tower: (3) Colors
Host connection type: RS232 C
Mini-environment: Synetics
Desktop PC
Central Bath Reservoir: 150 liters for (3) Plating modules
Exhaust kit: Top mount
Cassette handler module:
(3) Load port stations
Wafer aligner type: Mechanical center finder
End effector
Wafer release with puff
Magstore 1.7.0 Robot firmware
Mapping type: Through beam
Plating cell configuration: Cell 1 / 2 / 3
Clamshell: Drive unit, 8"
Clamshell cup: 1 A Ceramic Cup
Clamshell cone: 196 mm Phase
Clamshell cylinder: Pressure vacuum cylinder
Anode Type: 3-Phase
Clamshell lift
Additive dosing: NowPack
Bath chemistry: Control algorithm
AE Pulse plating power supply
Post plating cell configuration: Cell 1 / 2 / 3
Edge bead removal
Wafer present sensor mount
Bath module:
(2) Florite totalizer
(3) Dosing pumps
Recirculation pump: Inverter
NESLAB HX-75 A Heat exchanger
2001 vintage.
NOVELLUS® NOVELLUS Sabre XT reactor is a precision-controlled chemical vapor deposition (CVD) equipment that enables customers to perform high-yield and accurate films deposition on a large array of materials. The system has been specifically designed for optimized thin-film deposition in the semiconductor manufacturing field. NOVELLUS SABREXT reactor offers a number of benefits, such as low cost of ownership, improved productivity, excellent design flexibility, and consistency of process results. The unit is highly accurate with a high degree of control and offers a full suite of process options with both single- and dual-chamber systems. The CVD process of Sabre XT reactor is integrated with a number of features such as pre-heating, cooling, and intelligent sensing. The pre-heating is important for setting the substrate temperature correctly before the deposition proceeds. The cooling feature helps to ensure that the substrate is brought back to the desired temperature quickly after the deposition. The intelligent sensing of the process allows the machine to detect, identify, and control the gas flows accurately, thereby ensuring a precise and uniform deposition of the film. The reactor features a unique filter chamber design which helps to minimize the introduction of particles into the process chamber. The crossover chamber also helps to prevent condensation of process gases that are condensed in the hoods. The tool has a multi-step process which is optimized for the high throughput of multiple substrates. SABREXT asset also has an advanced plasma source compatible with a number of gas disposal technologies. The new plasma source supports ultra-high purity source gas, high throttle gas flow, and high source exhaust pressure. This allows for higher deposition rates, higher power densities, and lower effective temperature. In conclusion, NOVELLUS® NOVELLUS Sabre XT reactor is a modern and advanced CVD model that helps to achieve higher yields and consistent results in the field of semiconductor manufacturing. The equipment features low ownership costs, increased productivity, and flexible design capabilities. It is also equipped with advanced features such as pre-heating, cooling, and intelligent sensing. The filter chamber design and specialized plasma source make NOVELLUS SABREXT a complete package for reliable CVD processes.
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