Used NOVELLUS Sabre #9105124 for sale

NOVELLUS Sabre reactor is a chemical vapor deposition (CVD) reactor designed for use in semiconductor manufacturing processes. It is a specially designed CVD reactor capable of depositing ultra-thin films with thickness down to single angstroms (0.1 nm) onto semiconductor wafers. The reactor is used for depositing materials such as difficult to deposit transition metals, polymers or other dielectric materials. Sabre reactor is built with several components that in combination make up the complete deposition system. The main components include an upper chamber, the process chamber and a lower chamber. The system is a vertical, low pressure CVD reactor, utilizing a batched process approach that allows for the deposition of multiple layers, all of which are tightly controlled for exact parameters required for their unique film thickness. It is capable of handling up to 8" and 12" wafers. The upper chamber is equipped with a heated quartz susceptor cage, which provides uniform heating of the wafers during the deposition process and ensures precise stoichiometry is maintained throughout the process. The heated susceptor cage is also used to evaporate the source material, which vaporizes and isSource material vaporization facilitates sublimation or thermally decomposition of the source material, which then deposits onto the substrate. The heated susceptor cage is connected to a proportional-integral-derivative (PID) controller which helps ensure optimal uniformity for heater temperatures. This is increased or decreased, depending on the specific deposition process requirements. The process chamber is filled with an inert gas mixture and is used to contain the chemical species being deposited on the wafer during the CVD process. A nozzle is positioned within the center of the vacuum chamber and is used to introduce precursors and reactants into the chamber. The deposition zone is connected to a diffusion pump and allows for the precise flow and manipulation of the gases necessary for the successful deposition process. The lower chamber is used to exhaust the reaction products and is also connected to a diffusion pump that is utilized to maintain the precise stoichiometry during the deposition process. It also helps evacuate any of the remaining reactants from the chamber's environment. NOVELLUS Sabre is a high-precision CVD reactor designed to facilitate materials deposition with extremely thin films. Its ability to produce desired layers with accurate and reliable results makes it an invaluable tool in semiconductor fabrication processes, allowing for the creation of superior semiconductor products.