Used NOVELLUS Sabre #9299039 for sale

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Manufacturer
NOVELLUS
Model
Sabre
ID: 9299039
Wafer Size: 12"
Vintage: 2002
Copper plating system, 12" Main tool FOUP Integrated robot NESLAB Chiller Missing / Faulty Parts / Accesorries Lift controller MCM Controller CIM: SECS GEM 2002 vintage.
NOVELLUS Sabre is a high-performance, precision reactor designed to deposit thin film materials on substrates. This reactor is used in the thin film deposition process employed in microchip fabrication, commonly known as "metal deposition". Sabre is an advanced Molecular Beam Epitaxy (MBE) tool that enables manufacturers to achieve precise control of materials deposited during the process. NOVELLUS Sabre's design is based on the Linear Dimethyl Blanket Molecular Beam epitaxy Reactor (LDB-MBE). This groundbreaking equipment eliminates the need for an inlet window, leading to higher yields and fewer particle contamination. Additionally, the use of a dual chamber system design ensures greater stability and higher deposition rates. Sabre is constructed from two primary chambers: the Lower Processing Chamber (LPC) and the Upper Processing Chamber (UPC). The LPC contains the gun pots, crucibles, and the deposition source materials. The gun pots are also known as electron cyclotron resonance microwave frequency sources, which creates the highly energetic atomic beams that are directed onto the substrate surface for the deposition process. The crucibles are made from refractory alloy and hold the liquid sources within them. The UPC consists of the Heating/Cooling shield (H/C shield), the substrate holder, and the exhaust line. The H/C shield is used to maintain temperature control of the substrate during the deposition process. The substrate holder has the capacity to hold multiple wafers at the same time and automatically level them for uniform coating. The exhaust line adds additional control, preventing debris and exhaust gases from entering the deposition area. NOVELLUS Sabre reactor also features a quartz deposition zone and crucible pressure control that provides uniformity of thin film deposition, creating reproducible results. For maximum safety, an entirely Inert Gas Unit (IGS) is incorporated, which operates to reduce the presence of deleterious gases, such as ozone or hydroxides, during the deposition process. Sabre reactor is an ideal tool for advanced microchip fabrication processes. The combination of the latest in technology with precision engineering offers manufactures the capability to achieve reproducible results as well as high-quality, uniform deposition film. With this versatile machine, manufacturers can reap the benefits of increased accuracy, safety, and efficiency of production.
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