Used NOVELLUS Sabre #9299776 for sale

NOVELLUS Sabre is a reactor designed specifically for semiconductor processing. It is used for the deposition of thin film materials in complex integrated circuits and micro-electrical-mechanical systems (MEMS). Sabre is a batch type process, meaning that the user can process a large number of substrates at a given time, which gives it a great advantage over traditional batch type machines. It is a closed system, and features fully automated gas distribution and control modules. NOVELLUS Sabre utilizes a high-speed, multi-gun, auto-selecting deposition process. This process enables the deposition of multiple layers of thin film material, such as insulators, metals, and organic materials, on substrates. Sabre offers precise control over the deposition process, making it an ideal choice for complex processes. The reactor features two distinct process chambers, including a high temp chamber and a low temp chamber. The high-temp chamber allows for the extreme temperatures needed for thin film deposition and chemical vapor deposition (CVD) processes. The low-temp chamber offers more modest temperatures and can be used for sol-gel and spin on processes. The reactor also features an automated wafer loading system, which ensures that wafers are loaded precisely and evenly on to the substrate holder. The heated wafer holder is able to precisely maintain temperature throughout the deposition process, thus ensuring optimal wafer performance. The entire process can be monitored through the unique NOVELLUS software package, ensuring accurate results each and every time. NOVELLUS Sabre has a unique dual-nozzle design that enables two parallel deposition processes, which can be used concurrently. This technology ensures that the deposited materials meet all requirements for proper deposition. Additionally, the reactor is equipped with a high-temperature effusion source that can be used for complex processes such as conformal coating and material deposition. In conclusion, Sabre is a powerful, efficient, and highly reliable reactor that is capable of producing complex, highly functional integrated devices. It meets all requirements for modern semiconductor processing and offers precise control and monitoring. As such, this reactor is an invaluable tool for any semiconductor fabrication facility.