Used NOVELLUS Sequel Express #9313087 for sale

Name: NOVELLUS Sequel Express
Brand: NOVELLUS
SKU: 9313087
Availability: InStock

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Photo Used NOVELLUS Sequel Express For Sale

Reactors

Manufacturer

NOVELLUS

Model

Sequel Express

ID: 9313087

System P166/64M Controller Signal tower: Front mount type LCD Monitor, 12.1" DLCM: Module P166/64M Module controller Cassette transfer: Shuttle type BROOKS AUTOMATION Magnatran 7 TM Robot, P/N: 003-1600-25 Indexer robot: Motor CDP2407-2 Animatics 26 Slots arc bar Auto cassette mapping MKS 750B11TCE2GK Manometer, 10 Torr GRANVILLE PHILLIPS 275 Mini convectron TYLAN ACX 3200 Throttle valve controller Slit valve type: L/L VAT/CH (3) 27-10157-00 IO Controllers CVD 1: Module ADVANCED ENERGY 3150274-004 B SE RF Match network View port left / Right RF Distribution Gas distribution No heat mix bowl (6) Shower heads Process chamber ring MESC Flange MKS 627A13TBC Manometer, 1000 torr MKS 627A11TBC Manometer, 10 torr UE PV48W-14 Vacuum switch, atmosphere UE E48W-H14 Vacuum switch, 15 torr VM3200 End point detector, integrated dual wavelength EPD (3) Digital dynamic 27-10157-00 IO controllers Throttle valve controller 02-123072-00 Rev A interlock PCB, CVD P166/64M Module controller Water flow switch Gate valve, Hi Vac, 4" Throttle valve Spindle mechanism: Ferrofluidic - Bellows type Process chamber: Vertical 4-line type Exhaust type: Vertical process chamber EUROTHERM Temperature controller Hastings gauge ADVANCED ENERGY PDX 1400 MF GEN RF Generator, P/N: 27-115617-00 F/R A ADVANCED ENERGY RFG 5500 Generator rack, P/N: 27-028379-00 F/R C MFC (AERA): FC-7800CD, 1SLM, SiH4 FC-7800CD, 5SLM, N2 FC-7800CD, 10SLM, He FC-7800CD, 10SLM, NH3 FC-7800CD, 20SLM, O2 FC-7800CD, 5SLM, O2F6 FC-7800CD, 20SLM, N2O FC-7800CD, 10SLM, N2 CVD2: ADVANCED ENERGY 3150274-004 B SE RF Match network: View port left / Right RF Distribution Gas Distribution Mix bowl: Temperature setting type (6) Shower heads Heater block Process chamber ring MESC Flange MKS 627A13TBC Manometer, 1000 torr MKS 627A11TBC Manometer, 10 torr UE PV48W-14 Switch, vacuum, atmosphere UE E48W-H14 Switch, vacuum, 15 torr VM3200 End point detector integrated dual wavelength EPD (3) IOC 27-10157-00 / Ver4.1 Controller, throttle valve Interlock PCB, CVD Rev A 02-123072-00 P166 / 64M Module controller Water flow switch Gate valve, Hi Vac, 4" Throttle valve Spindle mechanism: Ferrofluidic - Bellows type Process chamber: Vertical 4-line type Exhaust type: Vertical process chamber EUROTHERM Temperature controller Hastings gauge ADVANCED ENERGY PDX 1400 MF GEN RF Generator, P/N: 27-115617-00 F/R A ADVANCED ENERGY RFG 5500 Generator rack, P/N: 27-028379-00 F/R C MFC (AERA): FC-7800CD, 1SLM, SiH4 FC-7800CD, 5SLM, N2 FC-7800CD, 10SLM, He FC-7800CD, 10SLM, NH3 FC-7800CD, 20SLM, O2 FC-7800CD, 5SLM, C2F6 FC-7800CD, 20SLM, N2O FC-7800CD, 10SLM, N2 SSD: MSSD 01-132945-00, MSSD included UPS AC 208V, 3-Phase, 5-Wires, 50 Hz, 1000 kVA AC 208V (CVCF) Single phase, UPS 50 Hz, 20 Amps.

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NOVELLUS Sequel Express is a reactor used in the processing of nanoparticles for semiconductor and materials applications. Sequel Express equipment uses a unique horizontal plasma source configuration with vertical substrate supports to create a precise, clean environment for the production of advanced materials. The system is equipped with a number of advanced features to ensure high performance and consistency, including a UV-capable plasma source, a patented gas injector for precise gas addition, and a high-powered electromagnet for uniform magnetic field control. NOVELLUS Sequel Express reactor features a unique horizontal plasma source design which generates a plasma front from the upper side of the reactor towards the gas injector. The UV-capable plasma source has a short wavelength of less than 119 nm which helps to produce extremely small particles from the reactants. The plasma volume is maintained with a constant magnetic field, provided by the high-powered electromagnet. Additionally, the gas injector allows for precise atomization of high-pressure gas such as O2 and N2 during the synthesis of a wide variety of materials. Sequel Express also features a set of controls that enable the user to accurately program and maintain the reactor and its processes. It includes a digital power supply, programmable gate reference voltage, and a programmable user interface. The user interface enables manual and automatic control of the reactor, gas flow, pressures, and temperatures. Additionally, the unit also offers advanced monitoring of process parameters such as gas flow rate, plasma monitoring, temperature, pressure, and the presence of minute contaminants. Using this information, the user can determine the best parameters for a particular type of nanoparticle synthesis. NOVELLUS Sequel Express is a safe and reliable machine, which is designed for use in industrial laboratories. It is easy to operate and requires minimal maintenance. Furthermore, the tool is easy to clean and offers superior particle collection capabilities. Its advanced features and efficient design make Sequel Express the ideal choice for semiconductor and materials manufacturing.