Used NOVELLUS Speed #9218973 for sale

Name: NOVELLUS Speed
Brand: NOVELLUS
SKU: 9218973
Availability: InStock

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Reactors

Manufacturer

NOVELLUS

Model

Speed

ID: 9218973

System (2) Chambers System configuration: Mainframe: NOVELLUS C2 DLCM-S Pet, 8" CRT Monitor Local control: Module controller Communication network: ARCnet LAN Chamber A & B Position: NOVELLUS C2 SPEED-S Process module Transfer module: DLCM-S PET Fab interface: Standard GEM Interface Host interface: SECS DLCM PET Interface type: Tool controlled PET Dual-Load lock Cassette Module (DLCM): Loadlock chamber: Type: Shrink body integrated with PET Loadlock assy: Left & Right Left loadlock: IOC #2 Right loadlock: IOC #3 Cassette present sensor Auto rotation Loadlock slit valve o-ring type: Viton Indexer controller: CE T2 Indexer robot Gauge: 275 mini convectron Gas: Nitrogen Transfer chamber sensor PEC Station No wafer out of cassette detector Integrated cassette sensor Transfer chamber: MKS Baratron Loadlock Robot: BROOKS Mag 7 Robot blade: CERAMIC / Metal Robot arm type: (2) BROOKS Arm robots Load lock door: Open / Close sensor indicator Wafer on blade detector N2 Vent purge valve He purge MFC Type: BROOKS Throttle valve: MKS Dedicated transfer turbo pump: PFEIFFER TMH 260 DLCM Inert gas lines: N2 Supply CDA Supply He supply SPEED Chamber A & B Configuration: Type: NOVELLUS C2 SPEED-S Process module Frequency type: Dual HF + LF ADVANCED ENERGY RFG 5500 High frequency RF generator ADVANCED ENERGY PDX 5000 Low frequency RF generator Top match: TRAZAR SRN 1-2 Pedestal RF Match: TRAZAR AMU1OE-2 27-118072-00 Dome type: Standard/G10 Pressure switch sensor: VACUUM Switch PV48W-84 Gate valve: VAT Module controller system: MC1 / MC3 MFC Type: BROOKS Gas feed: Multi-line drop Gas 1 MFC 1: Ar 500sccm Gas 2 MFC 2: O2 500sccm Gas 3 MFC 3: NF3 1000sccm Gas 4 MFC 4: SiH4 200sccm Gas 5 MFC 6: SIF4 200sccm Gas 6 MFC 8: H2 2000sccm Gas 7 UPC1: H2 2000sccm Gas line in connect fitting: VCR Nickel coated ESC Type: Duratek-IC 8", semi Temperature probes and controller: NTM 500 C / 500 D Turbo pump type: MAG W 2200 Manometer type 10 torr: MKS Manometer type 100m toor: MKS Throttle valve: MKS Type Endpoint detector: VERITY SD2048DL Clean method: Toggle clean Clean gas: NF3 SPEED USG Process kit: CERAMIC Guard ring CERAMIC Process injector tube: 4.13'' Nozzle CERAMIC Clean injector tube: NOVELLUS CERAMIC Lift pin: NOVELLUS Turbo pump screen: Normal screen Pedestal height: 1.75'' SPEED FSG Process Kit CERAMIC Guard ring CERAMIC Process injector tube: 2.5'' Nozzle CERAMIC Clean injector tube: NOVELLUS CERAMIC Lift pin: NOVELLUS Turbo pump screen: Louver screen Pedestal height: 2.75" PEC Type: E-PEC Plate SPEED Calibration unit and jig: Black body calibration: CI SR40 / SR72 NOVELLUS OEM Dome jig NOVELLUS OEM Turbo jump jig Facilities: SSD: NOVELLUS OEM Power supply: 3 Phase, 208V UPS.

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NOVELLUS Speed is a PECVD reactor, designed to deliver superior process performance for semiconductor applications. Vestec, now a part of the Lam Research family of companies, originally conceived this innovative process chamber back in 1985. The name for the chamber indicates Speed of the process due to its unique design. This is partnered with the ability to fulfill the highest demands of thin-film processing applications. The reactor is specifically designed to meet the tightened requirements of modern semiconductor processing technology. NOVELLUS Speed chamber is constructed as a heavy-duty rectangular frame finished in aluminum. It contains a large single-piece low-thermal-mass susceptor that enhances the uniformity over the whole surface being treated. Inside the susceptor chamber is a gas manifold equipment with up to four different flows of gas to be metered and distributed uniformly across the reactor chamber. This ensures that the process gases are delivered to the substrate in an extremely uniform manner. To monitor and control the process gases inside the chamber, a real-time gas management system is incorporated that can monitor the flows and adjust them as necessary. Speed is also fitted with an advanced RF delivery unit that stays within the specifications of the process chamber. This offers robustness for the process, along with precise power distribution control. Furthermore, the reactor contains a well-placed hexode power machine designed to provide additional power when required, again allowing for precision control with regards the power fed into the chamber. A Film Thickness Monitor provides feedback on the precise thickness of the film applied onto the substrates, within +/- 10 angstroms of accuracy. The monitor also helps detect any passes in the film that may have occurred so that these can be addressed immediately. Another tool involved, NOVELLUS HotTech Process, is designed to increase the useful life of the chamber components, such as the susceptor, RF platen, hot plate, and so on. Taken as a whole, NOVELLUS Speed is a reliable and capable PECVD reactor. Its heavy-duty construction and advanced features give it the ability to consistently produce high-quality thin-film architectures with precision and repeatability, giving it an edge in the field of semiconductor processing technology.