Used NOVELLUS Speed #9262827 for sale

NOVELLUS Speed is an advanced chemical vapor deposition (CVD) reactor designed for high productivity and film quality. It is an advanced deposition equipment utilizing multiple CVD gases simultaneously to create layers of deposition that are thinner, denser, and more consistent than what can be achieved with manual systems. This revolutionary reactor's advanced design and capabilities allow for high layer deposition rates, high throughput and superior wafer uniformity. Speed is powered by a Pulsed Plasma Power and Delivery System. This unit is capable of producing a wide range of plasma gas powers and pressures from low to high. This ensures that the deposition is precisely controlled and that the highest quality layers are being produced. The integrated plasma source generator utilizes a pulse frequency and duty cycle to ensure that the correct power and pressure is delivered to the reactor chamber to achieve the desired process outcomes. NOVELLUS Speed's ED Graphite Magnetron Sputtering (GMS) enables additional deposition techniques including reactive sputtering, multi-layer and wet etch. The GMS is capable of producing higher density layers, increasing deposition rates and improving deposition uniformity while reducing materials waste. The GMS offers up to ten times more ionization efficiency compared to conventional magnetron sputtering systems. Speed is also equipped with an advanced Process Monitoring Machine that is capable of accurately measuring the process parameters and can detect abnormal process conditions quickly and easily. This tool tracks the deposition rate of each reactor chamber, the film thickness, contamination levels, and a host of other parameters in real time. NOVELLUS Speed uses the Ebonite Microwave technology to ensure uniform gas flow and deposition from wafer to wafer. This technology utilizes sophisticated microwave generator probes that create a uniform microwave plasma field inside the rf chamber, enabling better homogeneity of the deposition and a higher quality, thicker film. This microwave plasma also has the capability of easily patterning the film layers for advanced device structures and designs. Speed comes standard with a number of automated features such as a gas-mixing asset that automates standard recipes, an online recipe modification model that tracks changes to the recipe, and a real-time leak detection equipment that continuously tests the exhaust system for leaks. NOVELLUS Speed also offers an advanced self-cleaning feature that can be enabled to ensure superior chamber cleanliness. Speed offers superior deposition performance due to its advanced design, efficient power and delivery systems, uniform microwave plasma field, and automated safety and process monitoring systems. NOVELLUS Speed is well-suited for low-cost, high-yield depositions and is a true leader in the advancement of advanced manufacturing processes.