Used OERLIKON LEYBOLD Univex 350 #293822750 for sale

OERLIKON LEYBOLD Univex 350 is a versatile and advanced vacuum reactor equipment designed for a wide range of research and industrial applications requiring precise control over process conditions. This state-of-the-art reactor offers unmatched performance, reliability, and flexibility for a variety of thin-film deposition processes, surface modification, and material characterization studies. At the core of Univex 350 is its sophisticated vacuum chamber, which is constructed from high-quality materials and engineered to maintain ultra-high vacuum levels necessary for precise and controlled processes. The chamber is equipped with multiple ports for the introduction of gases, vapors, and additional accessories, allowing users to customize the system to meet their specific requirements. The reactor is equipped with a high-performance magnetron sputtering unit, enabling the deposition of thin films with exceptional uniformity and purity. The magnetron sputtering sources are capable of depositing a wide range of materials, including metals, oxides, nitrides, and alloys, onto substrates of various sizes and shapes. The advanced power supplies and process control software ensure accurate control over film thickness, composition, and microstructure. In addition to magnetron sputtering, OERLIKON LEYBOLD Univex 350 can be equipped with additional sources such as electron beam evaporation, thermal evaporation, and plasma-enhanced chemical vapor deposition (PECVD), expanding the range of possible deposition techniques and materials. This versatility makes the machine suitable for the deposition of complex multilayer structures, functional coatings, and innovative materials tailored to specific applications. The reactor is equipped with a comprehensive set of monitoring and diagnostic tools, including in-situ metrology systems for real-time analysis of thin film growth, surface roughness, and film properties. The integrated mass spectrometer allows for precise control over gas composition and partial pressures during deposition, ensuring reproducible results and high-quality film growth. Univex 350 features advanced automation and software control capabilities, enabling users to program complex deposition sequences, recipe management, and data logging for process optimization and reproducibility. The intuitive user interface provides a user-friendly experience, allowing both novice and experienced researchers to operate the tool with ease. In summary, OERLIKON LEYBOLD Univex 350 is a cutting-edge vacuum reactor asset that offers unmatched performance, flexibility, and control over thin-film deposition processes. With its advanced features, precise monitoring capabilities, and versatility in deposition techniques, this reactor is ideal for research laboratories, universities, and industrial R&D facilities seeking to push the boundaries of materials science and surface engineering.