Used OXFORD INSTRUMENTS Opal #293764744 for sale

OXFORD INSTRUMENTS Opal is a state-of-the-art chemical vapor deposition (CVD) reactor equipment designed for advanced material synthesis and thin film deposition in research and industrial settings. Opal reactor is a versatile and highly customizable platform that offers precise control over deposition parameters, making it suitable for a wide range of applications in the fields of nanotechnology, semiconductor manufacturing, and advanced materials research. Key features of OXFORD INSTRUMENTS Opal reactor include a high-temperature vacuum chamber, a gas delivery system with mass flow controllers, a temperature-controlled substrate holder, and a sophisticated software interface for monitoring and controlling the deposition process. The unit is equipped with multiple gas inlets for introducing precursors, carrier gases, and reactants into the chamber, allowing for precise control over the chemical composition and stoichiometry of the deposited films. Opal reactor is capable of depositing a variety of thin film materials, including oxides, nitrides, carbides, and other complex compounds, with high uniformity and repeatability. The machine can be operated at temperatures up to 1000°C, enabling the deposition of crystalline films with precise control over crystal structure, morphology, and thickness. The reactor can accommodate substrates of various sizes and shapes, including wafers, foils, and powders, allowing for flexibility in experimental design and sample preparation. OXFORD INSTRUMENTS Opal reactor is equipped with advanced safety features, including a pressure relief tool, gas sensors, and interlocks to prevent the release of hazardous gases and ensure safe operation. The asset is designed for ease of use and maintenance, with a user-friendly interface for setting up deposition recipes, monitoring process parameters, and analyzing data in real-time. The reactor can be integrated with additional accessories, such as in-situ monitoring tools, heating stages, and plasma sources, to expand its capabilities and enable new research opportunities. Applications of Opal reactor include the synthesis of functional coatings, semiconductor materials, and nanostructured thin films for electronic, optical, and energy storage devices. The model is used by researchers and engineers in academia, government laboratories, and industry for fundamental studies of material properties, device fabrication, and process optimization. The reactor's versatility and customizable design make it a valuable tool for exploring new materials and developing innovative technology solutions in a wide range of fields. In summary, OXFORD INSTRUMENTS Opal reactor is a cutting-edge CVD equipment that offers precise control over deposition parameters, high temperature operation, and a wide range of material compatibility. With its advanced features, safety considerations, and ease of use, Opal reactor is a powerful tool for researchers and engineers seeking to advance the frontiers of materials science and technology.