Used PICOSUN P-300BV #293769705 for sale

PICOSUN P-300BV is an industry-leading ultrahigh vacuum (UHV) Atomic Layer Deposition (ALD) reactor. P-300BV is designed and manufactured by the world's leading ALD equipment provider, PICOSUN. The equipment uses an electron beam as a power source for film growth. PICOSUN P-300BV has a small footprint, making it ideal for installation in limited laboratory space. It also features an advanced optical real-time monitoring system to allow for precise control of the process. The unit also offers low process temperature and excellent film uniformity. P-300BV is suitable for the deposition of ultra-thin uniform layers of complex metal oxides, nitrides, and thin film stacks in ultra-high vacuum. PICOSUN P-300BV is a highly efficient machine which is capable of a wide range of process techniques such as thermal and plasma ALD. The tool includes a reactive gas injection asset, allowing for the deposition of films based on precise chemical reactions between the gaseous precursors and the substrate. P-300BV is designed to provide maximum process efficiency and uniformity of film quality. The model is equipped with a versatile chamber design and an injector equipment which can provide controlled doses of precursor material. The system also features an integrated robotic handling unit which facilitates precise sample positioning. Additionally, the machine also features a high-precision backside view in-situ optical monitoring tool, allowing for real-time measurements of film quality. PICOSUN P-300BV also offers a complete suite of software tools, which can be used to monitor and control the deposition process parameters such as temperature, pressure, flow rate, and film thickness. These software tools can be used to optimize process parameters to create uniform and high-quality films. Finally, P-300BV is designed for easy maintenance and operation with a wide range of safety features to ensure the performance of the asset. PICOSUN P-300BV is designed to offer reliable and repeatable performance for a variety of ALD processes. With its advanced features and robust performance, P-300BV is an excellent choice for any ultrahigh vacuum ALD process.