Used PICOSUN P-300BV #293800189 for sale

PICOSUN P-300BV is a high performance atomic layer deposition (ALD) reactor designed to ensure maximum system efficacy for a wide variety of applications. Its advanced features and flexibility make it a highly efficient, reliable process tool for the production of uniform thin films with precise thickness control. The key to P-300BV's high deposition rate and outstanding uniformity is its horizontal dual-showerhead design. This ensures equal flow of the process gases across the entire substrate, resulting in uniform thin-film deposition over the entire substrate surface. Moreover, with this design, the chamber temperature can be maintained at the optimum level, allowing the user to obtain the desired preciseness of the thin films. PICOSUN P-300BV has a compact, convenient footprint and requires minimal installation and maintenance time. Its unique design allows for a wide variety of different processes to be performed. This includes ALD, Chemical Vapor Deposition (CVD), Anodic Oxidation and Atomic Layer Etching (ALE). P-300BV is also equipped with advanced software that enables precise process control and repeatability. PICOSUN P-300BV is equipped with the latest safety features, including pressure sensors and chemical spill containment. It also features a temperature range from 100°C up to 450°C, allowing it to be used for a wide variety of different processes. P-300BV also includes Magnetic Field Interference (MFI) shielding which enables the reactor to operate at very high field strengths without compromising performance. In addition, PICOSUN P-300BV is designed for ease of operation, maintenance, and cleaning, making it one of the most reliable and efficient ALD reactors on the market. The reactor is also designed to provide superior process control, repeatability and output. P-300BV includes easy-to-use graphical interfaces and automated routines that allow full process monitoring and tuning even during complex the processes. In summary, PICOSUN P-300BV is the perfect choice for users looking for a reliable, high performance ALD system that provides superior uniformity and efficient operation. It features advanced software and highly integrated safety features, allowing it to provide the highest yields and most consistent films available on the market. Its flexible design enables users to easily customize the process to meet their specific needs, making it an invaluable tool for production and research alike.