Used PICOSUN R-200 #293618159 for sale
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ID: 293618159
Atomic Layer Deposition (ALD) reactor
Vacuum chamber: Stainless steel vessel with KF connection flanges
(2) RC-200 Reaction chambers: 6-Inlets
SH-200 Sample holder
Substrate holder, 8"
PicoPlasma Inductively coupled remote plasma source
Heated sample stage: Up to 750°C
Mesh cradle MC200 for 3D samples
Trough porous sample holder
Controller
Touch panel PC
Deposition: Oxide (SiO2, Al2O3 and TiO2)
Precursor sources:
(3) Picosolutions
(2) Boosted Picohot 200: Heated source up to 200°C
Boosted Picohot 300: Heated source up to 300°C
(2) Picogas connections for thermal ALD
(2) Picogas connections for PEALD with Ar carrier gas
O3 System: PZ-100 Picozone
PF-200 Diffusion enhancer
Chemical precursors:
Type / Element / Chemical
Picosolution / Al / Trimethylaluminium electronic grade
Picohot200 / Ba / Bis (1,2,4-Tritertiarybutylcyclopentadienyl) Barium
Picohot 200 / Ba / Bis (Tri-isopropylbutylcyclopentadienyl) Barium THD
Picohot200 / Ru / ⁿ4-2,3-Dimethylbutadiene ruthenium tricarbonyl
Picohot200 / Si / Bis (Diethylamido) Silane
Picohot300 / Si / Bis (Diethylamido) Silane
Picosolution / Ti / Titanium (IV) Chloride
Picohot 200 / Ti / Titanium isopropoxide
Picohot200 / Ti / Titanium methoxide
Substrate loading:
Picoloader
Slit gate valve, 8"
Load lock
Manipulator
N2 Purge assy for load lock purge
Vacuum pump:
EBARA ESA70WD Dry vacuum pump
Flow rate: 420 m³/h
2-Stages pneumatic valve
Afterburner and mechanical foreline particle traps
Power supply: 400 V, 50 Hz, 3-Phase, 6 kW.
PICOSUN™ PICOSUN R-200 is an advanced ALD (Atomic Layer Deposition) processing equipment designed for industrial production scale high uniformity and high throughput surface coating applications. This system is designed to meet the high quality requirements of industrial and research applications such as reflective surfaces, conformal surfaces, optical coatings, and thin films for various applications. PICOSUN™ PICOSUN R 200 reactor is based on a modular architecture allowing for flexibility and scalability that allows the user to customize the unit to their specific application needs. The machine can be equipped with a wide range of standard components and reprogrammed to fulfill unique customer requirements. The main components of R-200 reactor include a generator, reactants, reaction chamber, substrate holder, and exhaust. The generator supplies reactive gases to the reaction chamber in accurate amounts, ensuring high repeatability during coating. A vacuum exhaust tool removes reaction byproducts after each cycle, allowing for fast process times and reliable results. R 200 reactor features a compact and maintenance-free design that is easy to install and requires minimal maintenance. The reaction chamber and substrate holder are made of high quality stainless steel and are designed to ensure cleanliness and durability. PICOSUN™ PICOSUN R-200 reactor is designed for larger scale production and is capable of coating substrates of sizes up to 200mm and 1000 x 1500mm. It offers high throughput capabilities with maximum chamber loading up to 80% and ALD cycle times up to 59 seconds. It offers high uniformity film growth with a chamber uniformity less than ±2% and a thickness uniformity of ±1 nm. PICOSUN R 200 reactor is capable of handling a wide range of films from Ceramics, Metals, Complex Oxides, Nitrides and Germanides. It offers fast, reliable and repeatable films growth for a highly demanding coatings industry. The asset is suitable for various research and industrial applications, and provides superior film quality, repeatability, and performance for all surface coating applications.
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