Used PICOSUN R-200 #293628600 for sale

PICOSUN R-200 is a compact, high-performance compact Atmospheric Pressure Plasma (APP) reactor equipment designed for research and small to medium scale production applications. The system features a single high-power RF source with a maximum 200W output, a stainless steel chamber, a pressure chamber and fully adjustable process parameters. PICOSUN R 200 offers superior performance and precise control over temperature, gas flow and pressure. R-200 utilizes a patented cold atmospheric pressure plasma technology that is capable of creating highly uniform plasma across its entire chamber volume, allowing for deposition and etching of wafers and other substrates with precise uniformity. R 200 is an ideal solution for the production of Optoelectronic and Microelectrodynamic (MOEMS) structures, as well as the precise drying, etching and deposition of a variety of materials. With its adjustable process parameters, PICOSUN R-200 is also highly suitable for the precision curing of polymers and coatings. PICOSUN R 200 offers advanced process monitoring and control capabilities. The user interface (UI) provides process visualization and independent control of flow rates, pressure and process temperatures. In addition, R-200 features an integrated data analysis and reporting unit that allows the user to monitor and view the process in real-time and adjust the process parameters accordingly. R 200 offers an automated wafer loading and unloading machine, allowing the user to quickly and accurately load and unload wafers with minimal downtime. PICOSUN R-200 also provides both on-board and external wafer alignment capabilities to ensure precise results every time. PICOSUN R 200 is an efficient and reliable tool designed to deliver high-performance results at an affordable cost. With its superior process control and precise uniformity, R-200 is the perfect choice for precision processing of a wide variety of materials.