Used PICOSUN R-200 #9283497 for sale

PICOSUN R-200 is an advanced, modular, and user-friendly Atomic Layer Deposition (ALD) reactor. It is designed for industrial-scale, high-volume production of thin films of various materials, such as materials with nanostructures and various oxide materials. PICOSUN R 200 has a modular design, allowing for any number of process modules to be used to create specific process modules with small footprint. R-200 also contains a heating/cooling equipment, with temperature up to 1000 degrees Celsius flexibility. R 200 is a closed chamber chemical vapor deposition (CVD) system which has been developed for the large-area deposition of thin, uniform films of various materials. The chamber is constructed with an inert, non-conductive ceramic material. Inside, a gas inlet and outlet allow for easy compatibility with custom-specified precursors. PICOSUN R-200 is equipped with an advanced computer unit that enables researchers to monitor and control reaction parameters such as temperature, reaction time, gas flow, pressure, and gas composition. Process parameters can be tuned with accuracy of +/-0.05 deg C to produce consistent high-quality thin films. The precursor gases are introduced in a consistent way into the deposition chamber, controlling the deposition rate and ensuring uniformity. PICOSUN R 200 offers an efficient, reliable, and cost-effective platform to control parameters and ensure a precise deposition process. In the event of an emergency, R-200's safety machine will reduce the pressure to the leakage safety level, shut off the gas, and flush the chamber air. R 200 is designed for mass-production and can handle up to 60 wafers at a time. The addressable area for sample deposition is a maximum of 300 mm x 300 mm. The single-wafer loading mechanism ensures a secure process, ensuring uniform films across the entire wafer. PICOSUN R-200 provides a secure and reliable coating solution for research and industrial needs. Overall, PICOSUN R 200 is a reliable, efficient, and advanced ALD reactor tool. With its advanced technology and high-accuracy process control, R-200 is ideal for industrial-scale, high-volume production of thin films of various materials.