Used PICOSUN Sunale R 200 #9182976 for sale
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ID: 9182976
Wafer Size: 12"
Vintage: 2013
Advanced ALD system, 12"
Maximum temperature: 500°C
Vacuum chamber:
Stainless steel vessel
With KF/CF connection flanges
Reaction chamber:
Metal sealing surface
Single Si wafer / Smaller wafers: 4", 6"
Sample holder
Substrate holder: 8"
Wafer / Smaller wafers, 4", 6"
Advanced source control
Electronics system
Touch panel PC
Electronics cabinet
ALD and electronics
PicosolutionTM 600 source system
Cooled source systems
High vapor pressure liquid precursors
Maximum capacity: (3) 600mL
Boosted PicohotTM 200 source system
Heated source systems: 200°C
PicohotTM 300 source system
Heated source system: 300°C
PicogasesTM connection
ALD Precursor
Vacuum chamber: AISI304
Reaction chamber: AISI316L
RC-200 Chamber with metal sealing surface
Sample holder: SH-200
(2) High vapor pressure chemicals
Low vapor pressure metal precursors
Includes:
Plumbing
Valves
Control of extra gas source
2013 vintage.
PICOSUN Sunale R 200 is a versatile chemical vapor deposition (CVD) reactor used for the deposition of thin films. It is designed to create extremely thin and high-quality coatings, as well as enabling indium tin oxide (ITO) and macrovoid-free antireflection layers. It can also be used for 3D-printing and diamond-like-carbon (DLC) coatings. Sunale R 200 is a compact, robust, self-contained equipment. It is equipped with an advanced Automatic Film Thickness Control (AFTC) system that offers superior batch-to-batch repeatability of the coating thickness and quality. The reactor also offers high deposition rates and high process stability. It is capable of obtaining a uniform, defect-free growth of thin films for both high-temperature and low-temperature processes. The unit has a high throughput, and is suitable for high-volume deposition applications. Additionally, it is capable of working with large substrates, up to 200 by 500 mm or a single 400 by 500 mm wafer. Its advanced vacuum chamber design specializes in uniform deposition of thick films, requiring minimal chamber purging. Furthermore, the machine has an automated exhaust tool that ensures precise purges of up to 10 mbar in a few seconds. PICOSUN Sunale R 200 is equipped with a high-temperature ultra-violet (UV) pyrometer that aids in controlling temperature profiles and uniformity within the chamber. The asset also has an optical thermometer that measures the temperature at the chamber walls, helping to ensure safety and uniform heating. It also features an inert gas introduction window that allows for the introduction of inert gases for growth processes that require additional gases for deposition. Sunale R 200 is well-equipped for a range of CVD applications, providing superior quality for the deposition of thin films. It offers high deposition rates and superior process stability, and its automated AFTC model ensures superb batch-to-batch reliability. The automated exhaust equipment, together with the inert gas introduction window, ensures precise processes and high throughput. The system is highly versatile, enabling the deposition of a wide variety of thin films, including indium tin oxide and diamond-like-carbon coatings.
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