Used PLASMATHERM LAPECVD LMTM #9382228 for sale

PLASMATHERM LAPECVD LMTM is an advanced low pressure, low temperature, microwave plasma-enhanced chemical vapor deposition (CVD) reactor. LAPECVD LMTM is a unique, advanced absorption-mode CVD reactor distinguished by its low-temperature and pressure performance. The reactor's low-temperature and pressure capabilities are enabled by the use of a microwave-plasma feed gas that is generated within the reaction chamber itself. This allows for a higher level of control over the deposition process. The reactor has a cylindrical stainless steel chamber with a 4 inch-ID outlet hot zone, a 2 inch-ID cold zone, and a variable frequency microwave generator located on a movable arm. It is equipped with a quartz tube containing microwave windows and a top load system. The top load system is made up of four semi-spherical plates that together can be adjusted in order to control the deposition process. The plasma feed gas is introduced into the reaction chamber at a controlled flow rate via a slit-valve. The flow of feed gas is then directed towards a diffuser, which in turn homogenizes the plasma inside of the chamber. The diffuser also acts as a pressure regulator, enabling the chamber to be operated in both low-pressure and high-pressure regimes. A direct current (DC) bias power supply is used to control the properties of the plasma feed gas. By applying a negative bias voltage, the electrons will be accelerated towards the substrates, resulting in increased reactivity and improved deposition rates. The microwave generator is coupled to a plasma maintenance module, which helps to maintain the plasma field at the desired operating parameters. When properly adjusted, the resonance properties of the plasma can be maintained from start-up and throughout the entire process. This ensures a more uniform deposition of the solid films on the substrates. PLASMATHERM LAPECVD LMTM is capable of producing high-quality thin film coatings on a wide range of substrates. Examples of possible applications include the deposition of oxides, nitrides, preventive coatings, and alloys. Its versatility and reliable performance make it an excellent choice for almost any deposition process.