Used PLASMATHERM LAPECVD PDC #9382231 for sale

PLASMATHERM LAPECVD PDC is an advanced plasma enhanced chemical vapor deposition (PECVD) reactor designed to meet the demanding needs of contemporary semiconductor and optoelectronic device fabrication. The PDC utilizes advanced features such as laser assisted plasma (LAPECVD) and quenchless plasma generation to deposit high quality, low-defect dielectric, conductive, optical, and other materials on a variety of substrates at temperatures up to 1000°C. The advanced LAPECVD equipment creates a highly uniform, stabilized, and homogeneous plasma with a low-temperature electron energy distribution via a three-cavity laser system. These features enable the unit to deposit uniform and dense film layers with precise control of parameters such as deposition rate, uniformity, impurity incorporation, gas duty cycle, and deposition temperature. The machine can also be configured to accommodate substrate sizes up to 330 mm in diameter, enabling efficient production of commercial as well as research grade material deposited films mid and large scale device fabrication. The quenchless plasma generation tool features a wide power processing range that allows rapid transitions between deposition and etching processes without having to cool down and restart the process. With a large source gas injection hole, the PDC provides additional improvements in reaction uniformity and stability. The PDC's advanced control asset includes a dedicated, integrated software interface designed to offer convenient control over the entire deposition and etching process, allowing easy adjustment of parameters including temperature/pulse power, pulse frequency, RF power, special gases, and substrate holder conditions. LAPECVD PDC model is an advanced and efficient PECVD reactor capable of meeting the toughest requirements in semiconductor and optoelectronic device fabrication applications. Equipped with advanced features and precise control options, the PDC provides a reliable, uniform, and consistent deposition of dielectric, conductive, optical, and other materials for a variety of substrates and device sizes.