Used PLASMATHERM PK-1241 #9135300 for sale

PLASMATHERM PK-1241 is a high-performance plasma reactor specifically designed for deposition applications. The reactor is equipped with a high-temperature capacitively coupled plasma source, as well as a high-speed mass-flow controller for precise process control. The reactor is capable of reaching temperatures up to 130 Celsius and is able to run processes in three different modes - uniform, directional, and one-way. The high-frequency, low-pressure discharge ensures that uniform and defined films can be achieved even with challenging process materials. The reactor is capable of handling a variety of substrate types including silicon, nitride, and polycrystalline. It enables rapid film deposition, resulting in short process times and improved production efficiency. The reactor is equipped with automatic water cooling, which allows for prolonged and effective operation. It is also equipped with a user-friendly HMI (human-machine interface) that can conveniently program individual process recipes. The reactor is equipped with a temperature sensing system that monitors the substrate and optimizes the process parameters. In addition, optical emission spectroscopy (OES) is available as an optional feature, which allows for accurate process monitoring and optimization. The system also features End of Film (EOF) detection, which enables automatic shutdown of the plasma discharge upon achieving desirable film parameters. The reactor chamber is constructed of stainless steel with special attention to materials compatibility and corrosion-resistance. It is powered by a three-phase power supply to ensure safe operation. The reactor is compliant with CE/EMC standards and is RoHS certified. In addition, the reactor is available in two models - the PK-1241LAR and PK-1241NAR. The PK-1241LAR is a low-arcing, large area reactor with a substrate size of up to 760 x 510 mm. The PK-1241NAR is a normal-arcing, narrow area reactor with a smaller substrate size of up to 130 x 40 mm. Both models feature a robust design, are easy to install and operate, and are capable of providing reliable and stable process results. PK-1241 is an excellent choice of a reactor for any deposition application. Its sophisticated design, high performance, and user-friendly features make it the perfect tool for accurate film deposition over a range of substrate sizes.