Used PLASMATHERM SEV-2DC #9072382 for sale

PLASMATHERM SEV-2DC Reactor is a plasma deposition/etching tool that allows thin film deposition onto a variety of substrates. The reactor utilizes an industry-proven parallel-plate configuration, allowing for uniform deposition of high-quality films over wide areas. The plasma source is a linear-inductively-coupled-plasma (LICP) generator, which delivers high-temperature and highly controllable plasma to the substrates. The plasma is generated by applying a high-frequency signal to an antenna or inductor. The plasma source is capable of supporting a variety of etch and deposition chemistries. The reactor chamber is constructed of stainless steel and is hermetically sealed to sustain a vacuum during the deposition process. Internal cooling is provided by a water-circulating jacket around the walls of the chamber to ensure uniform substrate temperature during operation. The reaction chamber is outfitted with two powered RF matching networks and one powered RF tuning network to ensure optimal plasma conditions for deposition and etching processes. In addition to the reaction chamber itself, the reactor includes a number of other key components. These are a vacuum pump, load-lock, vacuum gauges, equipment controller, gas panel, gas delivery system, and temperature sensors. The vacuum pump is responsible for evacuating the chamber and attendant lines, and the pressure is monitored by two vacuum gauges. The load-lock is used to introduce and remove substrates from the vacuum environment without having to break the shield, and double-door entry prevents loss of chamber pressure. The unit controller is a digital machine which provides user interface and control of all parameters such as antenna power, RF matching networks, deposition gas pressure, and reactant injection. The gas panel is responsible for introducing the appropriate reactants for etching and deposition processes. SEV-2DC Reactor is a versatile and powerful tool for thin-film deposition and etching processes, facilitating high-quality films under highly controllable conditions. With its combination of industry-proven features, robust hardware, and reliable control, the reactor delivers outstanding performance in a range of processes.