Used STS Pro CVD #9284379 for sale
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ID: 9284379
Wafer Size: 8"
Vintage: 2005
PECVD System, 8"
Process: Oxide (SiO2)
Silane based Plasma Enhanced Chemical Vapor Deposition
(2) Carousel load locks, 8"
CVD Chamber parts for single substrate processing
Top electrode: RF Bias
Process vacuum pump
DI Water chiller
Scholl pump
Single chamber:
Driven electrode: Upto 350°C temperature
Chamber heating upto 100°C via distributed cartridge heaters
Lid assembly heating of 300°C max via a cast block
High deposition rate with high gas flow capability
Chiller
Gas panel type: On board
(6) Gas lines
Load lock pump
Chamber pump
Maxi gas box: C4F8, O2, N2O, SiH4, NH3, N2, Ar, He
Mixed frequency configuration: ENI 13.56 MHz, 300W RF power supply
Dual power supplies:
RF Supply and matching unit: 500W (380kHz) RFPP LF-5
RF Supply and matching unit: 1000W (380kHz) RFPP LF-10A
2005 vintage.
STS Pro CVD is a chemical vapor deposition (CVD) reactor that is designed for laboratory-scale processing of advanced materials and their surfaces. This equipment is capable of producing thin films of a range of advanced materials, including metals, oxides, nitrides, carbides, and other complex compounds. The CVD process is based on the supply of precursor gases into a heated chamber, where the vapours react with the chamber surfaces to form thin films. Pro CVD system features a range of features to enable precise and safe processing of advanced materials. The unit is equipped with inert gas inlet, multiple exhaust ports, and an innovative sample holder design. The sample holder incorporates a unique field-reversing mechanism for reliable and uniform deposition of thin films on all types of substrates. The holder also has a built-in flow meter for efficient controlling of gas flows. STS Pro CVD machine is equipped with a high-power heating element capable of reaching temperatures up to 1300°C. The tool is capable of achieving uniform surface temperatures throughout the chamber for optimised CVD processing. The asset is also equipped with temperature and pressure sensors, as well as thrust and speed controllers, for precise control of process parameters. The design of Pro CVD Reactor also ensures efficient cooling, enabling quick ramp up/down and cool down times, for improved process reproducibility. In addition, STS Pro CVD Model is equipped with a transistor-based controller and user-interface. This facilitates comprehensive control of process parameters and accurate monitoring of the process. The user-friendly interface is also capable of displaying precise values of process parameters with rapid updates in real-time. Pro CVD Equipment is highly reliable and easy-to-maintain, making it an ideal choice for laboratory-scale processing of advanced materials and their surfaces. The system is designed for precise and efficient operation in harsh environment conditions. The unit also features energy efficiency and low power consumption, further contributing to cost savings.
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