Used TEL / TOKYO ELECTRON MB2-720 #9394396 for sale

TEL / TOKYO ELECTRON MB2-720 is a high-efficiency, semiconductor wafer fabrication process reactor. It is designed for processing of metals, oxides, nitrides, and other materials used in the semiconductor industry. TEL MB2-720 reactor utilizes a reliable, multi-level electron beam accelerators for the delivery of optimal process parameters and low-voltage deposition rates. The reactor has a lower operating temperature than other conventional reactors, offering more flexibility and precision during deposition. The multi-level electron beam accerlerators are capable of providing a higher linear acceleration rate, providing shorter processing times. The beam shapes and angles are optimized for optimal uniformity and deposition characteristics, and the beam can be controlled to optimize throughput and deposition control. The equipment also features an automated monitoring system which provides feedback on the process. This ensures optimal material utilization and precise results. TOKYO ELECTRON MB2-720 reactor utilizes the atmospheric pressure variation of the process chamber as one method of enhancing uniform deposition during production. This helps to reduce the variation between substrate position and substrate temperature. The unit also features a low-energy electron beam control machine capable of generating electrons and ions with a narrow energy distribution range to accurately control the deposition process. This helps to ensure uniform deposition. MB2-720 can be integrated into an entire semiconductor production line, allowing the same equipment to be used for multiple processes as well as substrate loading and unloading. The reactor is also designed for easy and effective maintenance, with components that are easy to replace. The tool also features an intuitive user interface, allowing for quick operator instruction and automated process control. Overall, TEL / TOKYO ELECTRON MB2-720 is an advanced and reliable reactor for processing of semiconductor wafers. It offers a high level of efficiency, uniformity, and control during fabrication, making it an ideal choice for semiconductor fabrication plants.