Used TEL / TOKYO ELECTRON / NEXX Nexx #9184468 for sale

TEL / TOKYO ELECTRON / NEXX Nexx TEL is a type of chemical reactor. It is a batch-type semiconductor fabrication reactor with uniform heat dissipation capabilities. The reactor is equipped with a silicon oxide etching system and is made of highly durable and corrosion-resistant materials, making it suitable for both low and high temperature semiconductor device fabrication processes. It also features a uniform heat dissipation layer, which allows for uniform temperature control within the reactor, making it ideal for precise and efficient device fabrication. The reactor is designed to be highly reliable with low maintenance requirements. It is also maintenance free, ensuring minimal downtime and cost. It is constructed from alloyed stainless steel and lightweight aluminum. This allows the reactor to be easily movable and durable for the long-term use of any device fabrication process. The reactor has multiple access points, which allows it to be easily deployed in any production environment. This is an important feature for ensuring continuous production and higher throughput. The reactor also features an integrated particle filter system, which enables clean and dry exhaust air to be released from the reactor once finished. This ensures a high quality product for customers and a low risk of contamination during device fabrication. TEL Nexx reactor is also equipped with multiple safety features such as an emergency shutoff system, alarm alert systems, and temperature sensors. This ensures that the reactor operates safely and securely, regardless of the environment or conditions. The reactor is capable of accepting various media recipes and is compatible with a variety of process techniques. These include chemical vapor deposition, sputtering, sublimation, etching, and more. This reactor is ideal for anyone needing to fabricate high quality semiconductor devices. With its high reliability, low maintenance requirements, and safety features, NEXX Nexx reactor is an excellent choice for any type of device fabrication process.