Used TEL / TOKYO ELECTRON NT333 #293591327 for sale

TEL / TOKYO ELECTRON NT333
Manufacturer
TEL / TOKYO ELECTRON
Model
NT333
ID: 293591327
Wafer Size: 12"
Atomic Layer Deposition (ALD) system, 12".
TEL / TOKYO ELECTRON NT333 is a high-performance chemical reactor that is suitable for a variety of industrial applications. TEL NT-333 reactor is designed to provide a low-cost, reliable and efficient solution for chemical reactions and processing needs. The primary purpose of TOKYO ELECTRON NT 333 is to provide a safe, efficient, and cost-effective way to conduct reactions in an industrial setting. The reactor is built on a low-cost stainless steel platform and includes features such as nickel-plated steel cladding, an integrated control unit, and an external control panel. The reactor is designed to optimize temperature, pressure, and flow rate to efficiently conduct reactions. It also offers multiple safety features such as an overcurrent protection system and an insulation system to prevent the build-up of heat. TOKYO ELECTRON NT333 reactor has a maximum output of 3300 liters/hour, making it a viable option for a range of industrial and laboratory applications. Due to its design, it is well suited for reactions that require a rapid heat transfer rate, making it a great option for reactions with accelerated reaction times. The reactor is also designed to meet the customer's safety requirements, as the reactor is constructed out of corrosion-resistant materials, making it an ideal choice for chemical processing applications. TEL NT333 is also highly functional, featuring an electronic control board and a variety of features for controlling pressure, temperature, and flow rate. The reactor is also designed to be easily serviced and maintained, with an easy to access control board that features regularly updated software updates. This makes NT 333 an ideal choice for reliability, safety, and efficiency when performing various chemical processes.
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