Used TEL / TOKYO ELECTRON NT333 #293659316 for sale

TEL / TOKYO ELECTRON NT333 is a state-of-the-art epitaxial reactor designed for both research applications and advanced device production. TEL NT-333 reactor combines a highly efficient design with a small footprint, allowing for seamless integration into the production floor. It is capable of handling all standard wafer sizes (2" to 8") with manual or robot loading and unloading. TOKYO ELECTRON NT 333 features a dual substrate heater chamber, and can heat substrates to maximum temperatures of up to 1,200°C. Optical pyrometer and temperature control systems ensure accuracy and repeatability during the deposition cycle. In addition, NT333 benefits from a unique gas delivery equipment that enables low pressure dynamic control-allowing for precise control over deposition rates and uniformity. The reactor also features an advanced power supply module, where electrode RF power can be programmed to control temperature and layer thickness. NT-333 is equipped with an advanced version of TEL E-VHS "active chamber cleaning" system. This unit provides a fast and efficient reaction time to changing process conditions, allowing for higher throughput levels and fewer reproducibility issues due to chamber contamination. TOKYO ELECTRON NT-333 also features a newly added microparticle filtration machine, providing stable processes with reduced particle levels and improved wafer yields. Finally, TEL NT333 also offers a comprehensive environmental monitoring tool, providing real-time data on a variety of prameters, including gas pressure, temperature, radio frequency power, temperature distribution, and pressure distribution. Analysis of this data can help process engineers easily identify any abnormalities, and provide a platform for accurate spectral data collection, facilitating process optimization and the enhancement of process yields.