Used TEL / TOKYO ELECTRON Trias High-K #9399573 for sale

TEL / TOKYO ELECTRON Trias High-K Reactor is a revolutionary piece of equipment developed by TEL Ltd. This reactor utilizes a high-temperature process to reduce the presence of high-k dielectric oxide films in wafer production. This process is essential for the fabrication of modern day semiconductors and other components. The reactor works by emitting plasma generated by microwaves and hot cathode dirigible biasing. This form of cold plasma decomposition uses a fluorine-based compound to remove the insulating oxide films present on wafer surfaces which in turn aids in the fabrication process. This High-K reactor makes use of a single-chamber material processing system which removes the oxide films in an ultra-clean environment and can process up to 200 mm wafer sizes with temperatures of up to 1000°C. In comparison with traditional strip and clean processes, TEL Trias High-K reactor takes lesser time to make use of fewer chemicals such as fluorine-containing etching gases and produces lesser environmental wastes. This is possible because of the automated recipe generation, efficient operation and low-maintenance provided by this reactor. As an example, the single-chamber reactor consumes an average of 35% lesser gas consumption when compared to a typical dual-chamber system. TOKYO ELECTRON Trias High-K reactor is highly energy-efficient and has provided significant benefits to the production and manufacturing of semiconductor devices. This reactor is capable of processing various specialized needs in producing some of the most complex semiconductor components, such as metal-oxide semiconductor (MOS) devices at temperatures greater than 1000°C. In addition to this, this reactor also enables chemical vapor integration (CVI) and chemical vapor deposition (CVD) processes which allow for better control of the physical and chemical properties of the films. Overall, Trias High-K reactor is an essential piece of equipment for modern-day semiconductor production. It is cost-effective, energy-efficient and environmentally friendly while also providing the high-temperature environment and chemical processes necessary for the fabrication of complex semiconductor components.