Used TEL / TOKYO ELECTRON Triase+ EX-II Ti/TiN #9252460 for sale

TEL Triase+ EX-II Ti/TiN is an advanced chemical vapor deposition (CVD) reactor, widely used in the semiconductor industry. It is designed to deposit ultra-thin films with excellent coverage and step coverage, essential for ultra-small electronic device fabrication. The Triase+ EX-II Ti/TiN reactor is equipped with an array of advanced high-throughput capabilities and features. It includes a high-power, high-frequency electron cyclotron resonance (ECR) plasma source for controlling the temperature, density, and energy distribution of reactant gases, allowing for precise control of deposition parameters such as material composition, film thickness, rate, morphology, grain-size, and surface roughness. In addition, the reactor is designed with a wide process window, allowing for the deposition of multiple films. The Triase+ EX-II Ti/TiN reactor also features high-efficiency heating zone technology, allowing for process temperatures up to 960 °C. This enhanced thermal control ensures accurate and precise deposition performance, while maintaining low thermal budget limits. The equipment also has easy-to-use control software and chamber automations for streamlining the deposition process, minimizing stress on the chamber components and enhancing system longevity. The reactor is well known for its reliable operation and excellent film quality. The deposition of Ti/TiN films is possible even for ultra-small dimensions, allowing users to achieve top-notch device fabrication. This reactor unit also has excellent step coverage, essential in the production of high-performance interconnects and contacts. TOKYO ELECTRON Triase+ EX-II Ti/TiN is a reliable, high-quality deposition reactor machine for producing superior Ti/TiN films. Its advanced features and precise film deposition capabilities make it the ideal choice for the most demanding semiconductor applications.