Used TEL / TOKYO ELECTRON Triase+ SPA #9252463 for sale

TEL / TOKYO ELECTRON Triase+ SPA is a specialized reactor for nano-structure and thin film growth. This reactor is one of TEL advanced Plasma Chemical Vapor Deposition (CVD) systems. It provides film deposition rates up to 5nm/minimum with superior quality, as well as low-temperature wet, thermal, and atmospheric processes. The patented TEL Triase+ SPA design enables the production of nanostructured films, as well as ultra-smooth surfaces with extremely fine features. TOKYO ELECTRON Triase+ SPA is equipped with a unique planar magnetron design that provides optimal control of the plasma. This enables efficient and reproducible production of pure and low defect density films. Furthermore, this equipment also has a Thermal Source kit available to heat up the substrate from 20°C to 500°C for different deposition applications. Triase+ SPA is capable of handling substrates up to 8 inches in diameter and is supplied with an aluminum heat shield to ensure uniform sample temperature and to prevent any unintentional evaporation of the sample. TEL / TOKYO ELECTRON Triase+ SPA can also be used for low temperature wet cleaning processes. The system is equipped with a centrifuge, a reservoir, and a manifold delivery unit for the controlled application of wet cleaning solutions. Additionally, the machine is also capable of atmospheric and dry processing, such as rapid thermal annealing (RTA), oxidation, nitridation, and phosphoration of substrates. TEL Triase+ SPA is an efficient and powerful tool for the production of nanostructure and thin films. Its reliable and reproducible process performance ensures the production of high-quality films. Moreover, the advanced control features of this tool provide optimal substrate and gas uniformity during asset operation. This makes the reactor ideal for use in a variety of deposition and annealing applications.