Used TOSHIBA / NUFLARE EGV-28FM #9069033 for sale

TOSHIBA / NUFLARE EGV-28FM is a high-performance electron beam lithography equipment designed for the production of advanced materials in the development of base wafers for the fabrication of semiconductor devices. The system consists of a direct write gun with a 14 cm diameter capable of producing patterns with very precise features down to 8 nm in size. It is also capable of extremely precise positioning of the beam on the wafer, which is necessary for the fabrication of high-precision semiconductor structures. The unit is designed for processing wafers with 300 mm or more and up to 28 inch wafers. The machine can process substrates such as gallium arsenide, silicon, and indium phosphide. It has the capability to pattern a range of structures, such as high-aspect ratio vias, contacts, nanometers, various metals, and polymers. The tool can also be used for alignment by overlapping the registration marks on the wafer with the drawn pattern. The gun is mounted on a rotatable stage, which allows for accurate alignment and a more uniform beam intensity across the wafer. The stage offers nanometer level precision and also allows for quick and precise positioning of the electron beam, reducing process time and improving throughput. The electron beam is generated using an impact ionization type electron source with a very high brightness. The source can be operated in various current levels from 1mA to 30mA, allowing to adjust the intensity of the beam. The asset also has a high resolution spot monitor for setting and maintaining beam quality. It can also be equipped with an in-chamber wafer load/unload facility, with alignment accuracy better than 50 microns. The electron beam activated plasma in the chamber can be used to process sensitive materials. The chamber is made from ultra-high vacuum approved stainless steel, designed for a low vacuum particle count. The high voltage power supply in the model is capable of providing an accelerating voltage from 0V to 50kV and is designed to ensure safely and reliable operation. TOSHIBA EGV-28FM is an advanced equipment for the production of new materials, with high resolution and accuracy. It can be used to fabricate various structures for base wafers, with the ability to accommodate any size of wafer, making it ideal for next generation semiconductor devices.