Used TOSHIBA / NUFLARE EGV-28GX #9069032 for sale

TOSHIBA / NUFLARE EGV-28GX is an ultrahigh-energy electron beam reactor designed for use with a variety of electronic applications. With its 28 mm2 (28 cm2) active area and an output beam of up to 40 kV, this equipment is ideal for use with a wide range of microelectronics such as photoresists, display panels, and wafer processing. Its high-energy electron beam creates a platform for etching, cleaning, deposition, and sintering through plasma-assisted processes. TOSHIBA EGV-28GX utilizes a multi-level laser based optical line scanning (OMS) system which has excellent beam stability when compared to single- and multi-beam scanning systems. The multi-level OMS unit comprises of two independent control systems, one for controlling laser emitters, the other for controlling the electron beam. In addition, NUFLARE EGV-28GX includes several laser focusing modes, offering the highest resolution and accuracy for etching or patterning small features in the square millimeter range. EGV-28GX utilizes a tungsten-plating film gun to create a uniform energy distribution and more precise energy deposition profiles, optimizing process production. Its capacitance-controlled, ion-blocking integrated electron gun provides a consistent, low-aberration electron beam for improved process uniformity. In addition, a backside gas collector allows for complete flush etching processes, eliminating the risk of ionic contamination. The advanced computer control machine offers great flexibility in terms of process parameter selection, allowing researchers the freedom to choose between single-stroke or pulsed operation and other available process parameters. The wide range of parameter modifiers available on TOSHIBA / NUFLARE EGV-28GX, coupled with an easy-to-use graphical interface, make it the ideal choice for precision wafer processing. TOSHIBA EGV-28GX is an exceptionally reliable tool that offers uniform processing. Its small foot-print and versatility makes it the perfect asset for any laboratory or research facility. With its precision and advanced capabilities, NUFLARE EGV-28GX is quickly becoming a leading choice for electron beam lithography and processing applications.