Used ULTRATECH / VEECO Savannah G2 #9396984 for sale

ID: 9396984
Atomic Layer Deposition (ALD) System S200 G2 (2) EDWARDS Vacuum pumps IBM Thinkpad with cables Reactor chamber Electronic control box with access panel removed Pumps parts included.
ULTRATECH / VEECO Savannah G2 is an atomic layer deposition (ALD) reactor mainly used for depositing a wide range of thin films. It can accurately control the growth of thin films from a few to hundreds of nanometers in diameter. This equipment is a single chamber atmospheric pressure ALD reactor with a cold-wall technology for process gas distribution. The system is capable of handling temperatures as low as -40°C and a range of reactive gas mixtures that allow it to deposit materials such as oxides, nitrides, and metals. VEECO Savannah G2 is equipped with two shower-head gas injectors suitable for highly reactive gases. These injectors are designed to provide even homogeneous gas flow at low flow rates. Moreover, the showerhead is suitable for batch process operations as it comes with a burst mode where material is deposited in a pulse form, ensuring uniform and repeatable results. Additionally, the unit is equipped with a rapid temperature ramping feature that provides high-throughput processes such as film growths when samples need to be heated and cooled in between cycles. Moreover, the machine is also equipped with a nitrogen purge tool for controlling the pressure in the chamber when using highly reactive gases such as water and hydroxy to reduce the deposition rate. Additionally, the asset has an integrated optical pyrometer that provides accurate thermal data and real-time feedback for controlling the temperature of the chamber. With its mechanical clamshell chamber opening, users can easily access the chamber without having to remove or modify components. It is also equipped with advanced control software that provides a platform for customizing processes according to the user's requirement. ULTRATECH Savannah G2 is capable of achieving growth rates up to 5nm/min and has very good repeatability when depositing the same film multiple times. It has successfully been used for research and development of new materials, and also for production of thin film devices such as microprocessors, solar cells, and light-emitting diodes.
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