Used ULVAC CMD-1500 #293634672 for sale

ULVAC CMD-1500
Manufacturer
ULVAC
Model
CMD-1500
ID: 293634672
PECVD System.
ULVAC-ULVAC CMD-1500 is a pulsed-DC glow discharge reactor used in the field of thin film deposition and material surface analysis. This type of reactor is often used in the fields of semiconductors and optics to produce intricate patterns on surfaces. ULVAC-CMD-1500 is comprised of two main parts: the plasma chamber and the pulsed DC power source. The plasma chamber is a hermetically sealed container with a maximum plasma processing volume of 190 liters. The chamber is equipped with a floating gate, a plasma-monitoring system, and electrodes for plasma generation. It also features multi-frequency magnetron operation. The pulsed DC power source consists of a high-voltage main transformer, a DC-DC booster, a switching-mode operation and a control circuit. The power source also contains a low-voltage anode coil and cathode electrodes. Its DC output, up to 6 kW, range from 0-200 V. ULVAC-ULVAC CMD-1500 reactor is a versatile and reliable source of plasma for thin film and surface analysis. The plasma generated by this device can accurately and precisely deposit desired materials onto substrate surfaces. In addition, the pulsed DC operation of the reactor allows for the creation of small, intricate patterns to be printed onto surfaces. This further increases the versatility of this device and allows for the production of high-quality, intricate products. ULVAC-CMD-1500 also features an intuitive user interface that allows for quick and easy setup and adjustment. This device also has several safety features including temperature control circuitry and an emergency shutoff switch. This ensures the proper operation of the reactor at all times, even during long and complex processing cycles. Overall, ULVAC-ULVAC CMD-1500 is an excellent choice for those looking for an efficient, reliable and accurate reactor for thin film or surface analysis. It is a powerful, intuitive and user-friendly device that is suitable for both small- and large-scale applications. This reactor has a long lifespan, excellent performance and great versatility, making it an ideal choice for a wide range of applications.
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