Used ULVAC CME-200J #293810220 for sale
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ID: 293810220
Vintage: 2008
PECVD System
Chamber
Controller
(4) Gas boxes
(7) Pumps
Gas scrubber
Accessories
Manuals
Power supply
PC
2008 vintage.
ULVAC CME-200J is a dual frequency industrial plasma reactor designed for deposition processes. It is equipped with two frequencies: 13.56 MHz (DC magnetron type) and 2.45 GHz (single frequency type). The reactor can process up to 9-inch wafer substrates and can easily adapt to various needs ranging from the development of materials to wafer-level production. It is equipped with a process gas mixer that allows for the accurate control of the mixing ratio of the process gases, allowing for precise deposition control. It also features an automatic power control system and a gas flow controller. The reactor has a cylindrical chamber with a volume of 11.2L and an electrode diameter of 200mm, making it suitable for a wide range of etching, deposition, and ashing applications. Additionally, it is equipped with a remote matching network, which helps to maintain a stable plasma environment during operation while also improving load matching accuracy. Furthermore, the reactor is enameled to ensure an impermeable, corrosion-resistant surface to prevent reaction of process gases with chamber surfaces. The reactor utilizes a turbomolecular pump to create a vacuum in the chamber, allowing direct control over the chamber pressure ranging from 1x10-3 to 1x10-7 Pa. It is also equipped with a pressure equalization mechanism that can accurately control the base pressure in the chamber. Furthermore, the system utilizes a simultaneous reaction control technique which is integrated into the process control software. This ensures stable and consistent process performance, even during batch processing. For safety, CME-200J is equipped with various protective features, such as pressure check and lockout, silence mode, and vacuum pumps monitored by pressure switch. It is also equipped with safety measures such as safety interlocks for chamber access and heat monitor. Additionally, the system is designed to operate within a temperature range of up to +50°C in the chamber and further equipped with exhaust heat reduction technology to ensure safe operation. In conclusion, ULVAC CME-200J is a powerful and reliable industrial plasma reactor designed for deposition processes and multiple wafer substrate processing. It is equipped with various automated process controls for precise control over the deposition process and is designed with several safety features to ensure safe operation at all times.
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