Used ULVAC CPD-1210 #9055162 for sale

ULVAC CPD-1210 is a chemical vapor deposition (CVD) reactor designed for the deposition of thin films onto semiconductor substrates. CPD-1210 features a vertically-mounted reactor body equipped with a quartz tube, internal atomizer, and heating elements. The quartz tube contains a gas inlet, gas outlet, and is lined with a water jacket to maintain the proper temperature of the tube. The internal atomizer provides a uniform distribution of gas molecules onto the semiconductor substrates. ULVAC CPD-1210 is a two-step process, with the first step being pre-coating the substrate, and the second step involving the actual deposition. During the pre-coating step, a pre-decomposition gas is introduced into the quartz tube, which is heated to a temperature that is suitable for the substrate to be treated. The pre-decomposition gas helps to break down the reactant molecules, allowing them to more uniformly deposit onto the substrate. The substrate is then exposed to a deposition gas, which is usually a combination of a metal-forming gas and a gas containing the material from which the film will be deposited. The deposition gas has a higher temperature than the pre-coating step and with the internal atomizer, provides a uniform deposition of the film on the substrate. CPD-1210 also has additional features, including an RF generator and an independent baking chamber, which allows for both pre-coating and deposition gases to be used in the same reactor chamber. ULVAC CPD-1210 has a single source, low pressure chamber, enabling the deposition of various kinds of material, such as metals, metals oxides, dielectrics, and semiconductors. The chamber is capable of a maximum temperature of 1200°C, providing the flexibility to control and increase reaction rate and film quality. Overall, CPD-1210 is an ideal CVD reactor for thin film deposition, providing uniformity, high temperature control and flexibility for the deposition of different materials. ULVAC CPD-1210 is an effective and versatile tool for producing high-quality thin films in a short amount of time.