Used ULVAC ED-60000-D14 #9053842 for sale

ULVAC ED-60000-D14 is an advanced etching reactor designed for a range of research applications. It features a process chamber with a 6-inch inner diameter, which is capable of processing a wide range of substrates up to a temperature of 1400°C. The reactor additionally features an advanced pressure control equipment and a high-speed gas shower to ensure precise and consistent etching process control. ED-60000-D14 is designed to provide outstanding performance in etching processes for a range of substrates, including Si, SiO2, GaN, GaAs, and other materials. It is capable of processing materials up to a temperature of 1350°C, allowing for repeatable etching with the highest accuracy. The reactor also features ULVAC unique gas shower, which rapidly ensures the desired gas composition in the process chamber. This allows for greater control of the etching process and improved batch-to-batch uniformity. ULVAC ED-60000-D14 has a 1,400-liter process chamber and operates at maximum reduced pressures of 15 torr. This allows for shorter cycle times while maintaining etching accuracy. Additionally, the high-speed gas shower ensures a uniform, stable gas environment for precise etching control. The computer-controlled pressure control system enables uniform and stable etching rates for high-quality production of intricate patterns and intricate structures. To reduce the chamber wall temperature, ED-60000-D14 is designed with an enhanced insulation jacket. This feature helps to minimize the thermal loss from etching processes. It also offers improved process chamber temperature homogeneity and controllability as well as an improved process window. The integrated HeTCA cold trap further enhances gas unit performance and provides a clean gas environment of 20 mTorr or less. ULVAC ED-60000-D14 also offers an advanced vacuum pump machine designed for long lifetime operation and low cost of ownership. The tool utilizes a diaphragm pump, a molecular drag pump, and booster turbo pump to achieve a base pressure of 20 mTorr or less, thereby enabling precise gas controlling and etching conditions. In terms of safety, ED-60000-D14 features an advanced safety asset. It has multiple failure detection systems, which are designed to detect process chamber issues including, exhaust gas abnormalities, arcing, and heating procedure anomalies. The model also performs automatic environment monitoring and fault-blocking. In addition to this, ULVAC ED-60000-D14 has a liquid nitrogen cooling equipment which helps to ensure safe operation by avoiding any abnormal chamber temperature. In conclusion, ED-60000-D14 is an advanced etching reactor designed for research applications. It features a 6-inch process chamber and is capable of processing a wide range of substrates up to a temperature of 1400°C. ULVAC ED-60000-D14 also featured a high-speed gas shower and a pressure control system for precise etching process control. Additionally, the reactor incorporates a number of safety features, such as a liquid nitrogen cooling unit and a monitoring machine to detect unusual chamber temperatures, arcing, and gas leaks. Finally, ED-60000-D14 also includes a diaphragm pump, a molecular drag pump, and a booster turbo pump for effective vacuum maintenance.