Used ULVAC Entron-EX2 W300 #9314077 for sale

ULVAC Entron-EX2 W300 is a chemical vapor deposition (CVD) reactor designed for use in semiconductor device fabrication. The reactor is equipped with a high-efficiency, constant-temperature, low-NOx dual-zone burner that enables precise control over the process conditions. Entron-EX2 W300 is equipped with a range of features including internal and external gas blending, an integrated manifold, long life graphite susceptors, and a versatile controller. These features provide users with excellent stability and reproducibility, enabling both the deposition of high-quality films as well as core-shell and multi-layer deposition processes. ULVAC Entron-EX2 W300 allows users to easily create a wide variety of desired deposition recipes. Entron-EX2 W300 utilizes a 'batch-type' chamber that can accommodate up to four substrates at a time. The internal chamber dimensions measure 915mm (width) x545mm (depth) x 520mm height (including flange) and feature a tilting susceptor plate of 915mm x 545mm for precise film deposition. The susceptor plate is designed to evenly distribute heat across the entire substrate, thus producing uniform film deposition without causing directional effects. The cavity also features a low-profile quartz dome and a center-mounted gas inlet and outlet, which reduce the amount of scattering around the wafer during processing. Furthermore, ULVAC Entron-EX2 W300 reactor has the possibility to be configured with various solutions that can efficiently optimize the deposition processes. For instance, Entron-EX2 W300 is equipped with ULVAC coat-monitor-COG system, which can accurately measure both thin and thick films, and help users achieve a consistent and repeatable deposition across their substrates. Additionally, ULVAC Entron-EX2 W300 can be equipped with a cooled tail-shutter, that helps users to achieve lower operating temperatures and higher deposition yields. Overall, Entron-EX2 W300 is a high-performance CVD reactor that can help users carry out a range of semiconductor device fabrication processes. By employing ULVAC advanced features, along with user-friendly safety measures, users can effectively maximize process efficiency and ensure high-quality results.