Used ULVAC EX-550-C10 #9053843 for sale

ULVAC EX-550-C10 is a high-vacuum thermal evaporator reactor that provides powerful performance in thin film deposition and sample preparation applications. This equipment is designed with precision control and sophisticated safety features, making it a very reliable machine. It features an 8-inch heated crucible, enabling users to control the uniformity of the film deposit. This system is capable of achieving excellent vacuum properties, with the highest attainable pressure levels of 10-4 mbar. The process control for ULVAC EX 550-C10 is completely computerized, meaning users can set their desired parameters and achieve precise depositions without additional manual work. This computerization also means that the reactor operates with consistent reproducibility. The temperature of the crucible is controlled by a PID temperature controller for precise heat management. This ensures uniform temperature levels and avoids film distortions. EX-550-C10 also features an automatic source shielding device that is designed to prevent reactions between the evaporated materials and the walls of the reactor, a common problem in thermal evaporation. The reactant feed rate is adjustable, with an adjustable feed rate range of 0.05 to 10 ml/min. The unit is completed with a suction device to keep the reactants in the crucible, an exhaust tube assembly that filters out by-products of the reaction, and an exhaust valve. Version 2 of this evaporator includes an updated main vacuum controller to further enhance processes such as production rate and time. In addition, ULVAC also offers a wide range of additional equipment that can be connected to this machine, including adjustable valves, collectors, sample holders, pumps, and pressure controllers. For improved safety features, all processes on EX 550-C10 are monitored with an integrated interlock tool, ensuring exact measurements and safe operating conditions. Altogether, the advanced features and design of ULVAC EX-550-C10 make it a suitable choice for laboratories and industries engaged in thin film deposition applications. This reactor offers precise processes, reliable safety features, and reproducible results, along with exceptional high-vacuum performance.